High quality factor 1-D Er^3+-activated dielectric microcavity fabricated by RF-sputtering

Abstract

Rare earth-activated 1-D photonic crystals were fabricated by RF-sputtering technique. The cavity is constituted by an Er3+-doped SiO2 active layer inserted between two Bragg reflectors consisting of ten pairs of SiO2/TiO2 layers. Scanning electron microscopy is employed to put in evidence the quality of the sample, the homogeneities of the layers thickness and the good adhesion among them. Near infrared transmittance and variable angle reflectance spectra confirm the presence of a stop band from 1500 nm to 2000 nm with a cavity resonance centered at 1749 nm at 0° and a quality factor of 890. The influence of the cavity on the ⁴I₁₃/₂ -->⁴I₁₅/₂ emission band of Er3+ ion is also demonstrated.

Glass-based confined structures fabricated by sol-gel and radio frequency sputtering

“…7,22 The final resolution on the effective thickness obtained by this quartz microbalance is about 4 Å. Sputtering deposition of the films was performed by sputtering alternatingly with a 15 × 5 cm 2 titania target and a 15 × 5 cm 2 silica target.…”

“…Among these systems, planar microcavity resonators, also called (1-D) PCs, are the simplest photonic band-gap device exploitable to manage the spectroscopic properties of luminescent species such as rare earth ions, [4][5][6][7] and quantum dots. 8 Oxide-based dielectric materials are particularly suitable for fabricating PBG structures because they have wide transparency from the ultraviolet to the near infrared (NIR).…”

“…Furthermore, oxide-based dielectric materials have good resistance to temperature, corrosion, and radiation as well. Processes like ion implanting, 4 sol-gel, 6,8 electronbeam evaporation, 12 and sputtering 5,7,10 can be successfully employed for the fabrication of microcavities based on oxide dielectric materials. Processes like ion implanting, 4 sol-gel, 6,8 electronbeam evaporation, 12 and sputtering 5,7,10 can be successfully employed for the fabrication of microcavities based on oxide dielectric materials.…”

“…Processes like ion implanting, 4 sol-gel, 6,8 electronbeam evaporation, 12 and sputtering 5,7,10 can be successfully employed for the fabrication of microcavities based on oxide dielectric materials. 7 Concerning the realization of 3-D PC structures, in the last years numerous efforts have been devoted to the development of 3-D PC structures with a spatial lattice of the building blocks on the scale of light wavelengths. Moreover, the increasing of the interest in shifting the rejected wavelengths in different zones ranging from visible to near NIR 11,13 requires an accurate design of the structures 14 and a definition of flexible experimental protocol capable of adapting itself to different materials and spectral ranges.…”

Omnidirectional High Reflectors using 1-D Photonic Crystals

“…The 1-D PCs can be fabricated by using different deposition techniques such as electron beam evaporation, sol-gel method, holography and r.f.-sputtering etc. The different materials used to fabricate 1-D PCs for OBGs in various frequency ranges are tellurium/polyethylene for infrared , TiO2/SiO2 (Valligatla et al, 2012) for near infrared (NIR) and TiO 2 /SiO 2 (Lin et al, 2005) for visible light. TiO 2 and SiO 2 are non-absorbing and nondispersive high and low index dielectric oxide materials having good refractive index contrast, and are used for E-mail: jppandeymlk@gmail.com.…”