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1993
DOI: 10.1063/1.109647
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High quality epitaxy of YBa2Cu3O7−x on silicon-on-sapphire with the multiple buffer layer YSZ/CeO2

Abstract: High quality YBa2Cu3O7−x films on silicon-on-sapphire were grown using a multiple buffer layer, consisting of YSZ and CeO2. Ion channeling reveals the high crystalline perfection of the YBa2Cu3O7−x films. A channeling minimum yield for the Ba signal as low as 3% was measured. The normal state resistivity of 200 μΩ cm at 300 K, critical temperatures above 90 K, with transition widths down to 0.5 K, critical current densities above 2×106 A/cm2 at 77 K and surface resistance values of 1.4 mΩ at 18.9 GHz and 77 K … Show more

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Cited by 62 publications
(22 citation statements)
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“…A layer of CeO2 between the YSZ and the YBCO can be used to eliminate the minor variant. 18 Before settling on this fabrication process, two attempts were made at fabricating the device in the opposite order. That is, we tried first depositing, patterning, and ion-milling the Au/YBCO on the Ysz, then etching the silicon to forni the air-bridge.…”
Section: Fabricationmentioning
confidence: 99%
“…A layer of CeO2 between the YSZ and the YBCO can be used to eliminate the minor variant. 18 Before settling on this fabrication process, two attempts were made at fabricating the device in the opposite order. That is, we tried first depositing, patterning, and ion-milling the Au/YBCO on the Ysz, then etching the silicon to forni the air-bridge.…”
Section: Fabricationmentioning
confidence: 99%
“…The best results so far have been obtained with Yttria-Stabilized-Zirconia (YSZ) [2] or YSZbased multiple layers, e.g. Ce02 / YSZ [3], [4]. However, YSZ reacts with YBCO to form B a r 0 2 and does not lattice match in the c-axis with YBCO (it is therefore not compatible with the edge geometry needed for junction fabrication [5]).…”
Section: Introductionmentioning
confidence: 97%
“…In recent years a considerable attention was drawn to fianite films on silicon due to its electric and optic device applications, such as isolating layers in SOI (silicon-on-insulator) devices [32], gate dielectric in Si- [33,34], SiGe- [35] and A III B V -based [36] device structures, buffer layers for producing of optic coatings of films of various semiconductors [37][38][39][40], superconductors [41][42][43], ferroelectrics, etc.…”
Section: Functional Fianite Films On Si Ge and Gaas Substrates 41 Tmentioning
confidence: 99%