2012
DOI: 10.1016/j.jnoncrysol.2012.08.015
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High quality amorphous–crystalline silicon heterostructure prepared by grid-biased remote radio-frequency plasma enhanced chemical vapor deposition

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Cited by 11 publications
(6 citation statements)
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“…While much research has been carried out to develop passivation technologies and correspondingly high-performance optoelectronic devices, there is limited reporting of theoretical and experimental studies that directly observe the relationship between photocarrier extraction and the strength of the near-surface electric field. Moreover, commonly reported passivation/extraction technologies assume a constant surface recombination velocity for all photocarriers approaching the surface ( 24 ). However, the optical generation profile within a given absorber varies with the wavelength of the incident light.…”
Section: Introductionmentioning
confidence: 99%
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“…While much research has been carried out to develop passivation technologies and correspondingly high-performance optoelectronic devices, there is limited reporting of theoretical and experimental studies that directly observe the relationship between photocarrier extraction and the strength of the near-surface electric field. Moreover, commonly reported passivation/extraction technologies assume a constant surface recombination velocity for all photocarriers approaching the surface ( 24 ). However, the optical generation profile within a given absorber varies with the wavelength of the incident light.…”
Section: Introductionmentioning
confidence: 99%
“…To minimize the effect of surface recombination, passivation technologies have been developed principally in two forms: chemical passivation and field passivation. Chemical passivation reduces the surface defect states by saturating the dangling bonds (20,21,(24)(25)(26)(27)(28). Field passivation, in contrast, creates a surface electric field via fixed charges within the adjoining dielectric films.…”
Section: Introductionmentioning
confidence: 99%
“…Our numerical results show that it is possible to obtain beyond 29% efficiency with 10 µm thick solar cell textured by slanted parabolic pores when the effective surface recombination velocities (SRVs) of the front and rear contacts approach 10 cm/s. Although such low values of SRV have been achieved experimentally for a planar Si wafer with low doping [26], it is challenging to achieve such low SRVs for c − Si with high emitter doping [27]. The 25% efficient PERL cell [25] has relatively lower emitter doping than that considered in [27] and consequently, lower front surface recombination velocities for electrons (S n ) and holes (S p ).…”
Section: Introductionmentioning
confidence: 99%
“…With silicon surface passivation processes, the surface recombination velocity will be significantly reduced and the effective minority carrier lifetime will be increased, which will enable c-Si solar cells with efficiency approaching and greater than 30%. [21][22][23][24][25]…”
Section: Introductionmentioning
confidence: 99%