2002
DOI: 10.1063/1.1456968
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High-purity and high-quality 4H–SiC grown at high speed by chimney-type vertical hot-wall chemical vapor deposition

Abstract: 4H-SiC layers have been homoepitaxially grown at a high growth rate of 25 m/h by chimney-type vertical hot-wall chemical vapor deposition at 1700°C. Through photoluminescence measurement, the intrinsic defect, so-called L 1 peak, was found to be reduced under a C-rich condition. In the deep level transient spectroscopy measurement, the Z 1 center was also found to be suppressed under a C-rich condition. For a 75-m-thick epilayer, the net donor concentration was reduced to as low as 5ϫ10 12 cm Ϫ3. In low-temper… Show more

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Cited by 54 publications
(49 citation statements)
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“…Although high-quality 4H-SiC epitaxial growth has been realized in several CVD reactors [3][4][5] problems remain to be solved for the growth of thick epilayers; for example, the typical growth rate in SiC CVD has been 2-10 mm/h. A few attempts of fast epitaxial growth ranging from 10 to 25 mm/h at high temperature in several vertical hot-wall reactors have been demonstrated [6][7][8]. In order to fabricate high-voltage bipolar devices, not only high growth rate but also low impurity concentration and long carrier lifetime are required.…”
Section: Introductionmentioning
confidence: 99%
“…Although high-quality 4H-SiC epitaxial growth has been realized in several CVD reactors [3][4][5] problems remain to be solved for the growth of thick epilayers; for example, the typical growth rate in SiC CVD has been 2-10 mm/h. A few attempts of fast epitaxial growth ranging from 10 to 25 mm/h at high temperature in several vertical hot-wall reactors have been demonstrated [6][7][8]. In order to fabricate high-voltage bipolar devices, not only high growth rate but also low impurity concentration and long carrier lifetime are required.…”
Section: Introductionmentioning
confidence: 99%
“…Based on this dependence a model of a complex between N and C I or V Si has been suggested for the Z 1,2 defect. Fujihira et al [137] studied the defect in layers grown with the C/Si of 0.6, 0.7 and 0.8 and found the Z 1 concentration in the low 10 13 cm −3 range in one layer with the N concentration ∼ 1 × 10 16 cm −3 . The center was suggested to be an intrinsic complex involving a Si antisite or C vacancy [137].…”
Section: Dlts Of Intrinsic Defectsmentioning
confidence: 98%
“…Z 1 /Z 2 defects have been extensively studied using deep-level transient spectroscopy (DLTS). [1][2][3][4][5][6][7][8][9] The most prominent feature of the DLTS spectrum of electron-irradiated 4H-SiC samples is the Z 1 /Z 2 center located at about 0.7 eV below the conduction band. The prominent peak is due to two-electron emission from both Z 1 and Z 2 defects.…”
mentioning
confidence: 99%