2002
DOI: 10.1016/s0925-9635(01)00637-9
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High pressure diamond and diamond-like carbon deposition using a microwave CAP reactor

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Cited by 32 publications
(23 citation statements)
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“…The microwave plasma sintering process known as rapid discharge sintering (RDS), was carried out using a circumferential antenna plasma (CAP) microwave system according to a procedure described in detail in Ref. [24]. Plasmas were formed at a pressure of 5 mbar in an Ar and O 2 (volume ratio: 10/1) atmosphere.…”
Section: Methodsmentioning
confidence: 99%
“…The microwave plasma sintering process known as rapid discharge sintering (RDS), was carried out using a circumferential antenna plasma (CAP) microwave system according to a procedure described in detail in Ref. [24]. Plasmas were formed at a pressure of 5 mbar in an Ar and O 2 (volume ratio: 10/1) atmosphere.…”
Section: Methodsmentioning
confidence: 99%
“…The NiO x nanoparticles (~50 nm) were suspended in methanol (20 mg/ml) and the particulate layer NiO x is deposited by spraying using a similar technique to that described previously [33]. The microwave-assisted plasma sintering process known as rapid discharge sintering was carried out using a circumferential antenna plasma (CAP) microwave system described in detail elsewhere [34]. The plasma was formed at a pressure of 5 mbar in an argon and oxygen (10:1) atmosphere.…”
Section: Sample Preparation and Deposition Of Nio X Coatingsmentioning
confidence: 99%
“…In the case of the latter, a circumferential antenna plasma (CAP) microwave system was used [19]. The chamber was first pumped down to 0.1 mbar at which point 50 sccm of nitrogen gas (99.998%) was introduced and the pressure was adjusted to 5 mbar using a manual throttle valve.…”
Section: Thermal Treatments -mentioning
confidence: 99%