High precision temperature control for projection lens with long time thermal response constant

Shuo, 秦硕 Qin; Yan, 巩岩 Gong; Wen-quan, 袁文全 Yuan; Huaijiang, 杨怀江 Yang

doi:10.3788/ope.20132101.0108

Cited by 3 publications

(5 citation statements)

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“…The complex modeling process is avoided and the influence of disturbances is effectively suppressed and the system has strong robustness. Considering the limitations of the study by Nie et al 18 and Qin et al 11 in terms of the need for accurate modeling and the suppression of unmeasurable disturbances, the proposed adaptive GPC-PI algorithm can play some role in solving these problems. Reducing the impact of these uncertain factors is of paramount significance for improving the overlay accuracy and productivity of the lithography system.…”

Section: Discussionmentioning

confidence: 99%

“…The generalized predictive controller (Generalized Predictive Controller, GPC) is suitable for a nonlinear system that is difficult to establish a precise mathematical model. 11 Besides, it has superior control performance and robustness. 21,22 Figure 3 shows the principle of the generalized predictive controller.…”

Section: The Control Algorithmmentioning

confidence: 99%

“…The fluctuation of the circulating water temperature was kept within a range of 60.01°C. Qin et al 11 studied a compound control algorithm that combines model prediction, feedforward control and Smith predictor. It achieved a fast response speed and 60.01°C temperature control accuracy of projection lens.…”

Section: Introductionmentioning

confidence: 99%

“…5 Generally, the problem of large inertial constant, time delays, and multiple disturbances are the main challenges faced by temperature control system. The combination of control algorithms, such as fuzzy control, 6,7 genetic algorithm, 8 neural network control, 9,10 feedforward control, 11,12 and Smith predictor 13 with PID control algorithms, is a common used approach at present. Moreover, the integration of intelligent control strategies, such as fuzzy algorithms 14 and iterative learning control, 15 with advanced techniques like predictive control, holds significant promise in addressing challenges encountered in industrial control systems like time delays 16 and external disturbances.…”

Section: Introductionmentioning

confidence: 99%

“…Although the above studies have achieved good results in the temperature control of the lithography system, there are some limitations, such as the complexity of parameter tuning and poor robustness. Nie et al 18 did not address the research on disturbance rejection or robustness, and Qin et al 11 are currently addressing the problem of measurable disturbances such as thermal disturbances of laser light sources. However, further researches are needed to control partially unmeasurable or ill-characterized disturbances.…”

Section: Introductionmentioning

confidence: 99%

See 4 more Smart Citations

A temperature control algorithm for lithography machine based on generalized predictive control and BP neural network PI control

Lan,

Chen,

Xue

et al. 2024

Measurement and Control

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Temperature stability is a critical factor affecting the performance of the most subsystems in the lithography system, due to the high precision and sensitivity of system components to temperature variations. The temperature control system of the lithography machine is characterized by its large inertial constant, time delay characteristics, as well as susceptibility to multiple disturbances. The temperature control system of the lithography machine chiefly requires response speed, high accuracy, and stable and constant temperature control. The contribution of this study is not only avoiding complex precision modeling processes based on real-time parameter estimation and neural network self-tuning but also improving the performance of temperature control in real time under external disturbances. A novel adaptive algorithm with a cascade structure based on generalized predictive control (GPC) and backpropagation (BP) neural network proportional-integral (PI) control is successfully proposed for high accuracy temperature control of lithography machine with a large inertial constant, time delay, and multiple disturbances. In this study, firstly, the liquid circulating temperature control system is developed based on heat exchanger and heater. Secondly, an adaptive controller composed of GPC and BP neural network PI control is successfully proposed. A BP neural network is employed to enable the parameters of the PI controller to adjust in real time, and the mathematical model parameters of the control system are identified in real time by the least square method. Also, the performance of the proposed controller is evaluated comparing with conventional PI controller and GPC controller in terms of robustness and quantitative study of error analysis. Finally, the temperature stability and robustness of the temperature control system controlled with the proposed adaptive GPC-PI algorithm has been investigated by the simulation results carried out in different working scenarios. The simulation results show that the steady-state error from the proposed algorithm is less than 0.01°C under the action of disturbance input. It can effectively counteract the influence of environmental interference and time-varying system parameters. The results of the simulation experiment indicate that the proposed adaptive GPC and PI control algorithm exhibits significant advantages in terms of control accuracy, anti-interference ability, and robustness compared to the conventional control method.

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Section: Discussionmentioning

confidence: 99%

Section: The Control Algorithmmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

A temperature control algorithm for lithography machine based on generalized predictive control and BP neural network PI control

Lan,

Chen,

Xue

et al. 2024

Measurement and Control

View full text Add to dashboard Cite

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High Precision Temperature Control System for an Oven-Controlled Crystal Oscillator

Xie¹,

Chang²,

Shu³

et al. 2015

TOAUTOCJ

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Environmental temperature is a highly influential factor regarding the stability of the crystal oscillator frequency. Thus, a high precision temperature control system is critical for improving the frequency stabilization of crystal oscillators. This paper proposes a temperature control system, including a high sensitive thermistor, precision reference voltage source and an instrumentation amplifier for the temperature measurement and preamplifier. System level MCU-MSC1210 acts as a main controller, and a novel way of the "interrupt + ribbon" strategy is adopted to realize real-time task scheduling. The PID controller program is crafted with the help of the "anti-integral saturated" and "bumpless transfer" algorithms. The cascade control system with the heating current of negative feedback is then realized using the triode tube consumption heating style. The results show that the temperature and fluctuation of heat voltage have almost no effect on the heating current when the heating system voltage fluctuates between 2.2 ~ 8V. Within those parameters, the temperature deviation remains within 0.01 degrees. Thus it can be seen that the high-performance temperature control system has a high anti-interference capability and a similarly high level of accuracy.

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Simulation Research on the Thermal Effects in Dipolar Illuminated Lithography

Yao

Gong

2016

Journal of the Optical Society of Korea

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The prediction of thermal effects in lithography projection objective plays a significant role in the real-time dynamic compensation of thermal aberrations. For the illuminated lithography projection objective, this paper applies finite element analysis to get the temperature distribution, surface deformation and stress data. To improve the efficiency, a temperature distribution function model is proposed to use for the simulation of thermal aberrations with the help of optical analysis software CODE V. SigFit is approved integrated optomechanical analysis software with the feature of calculating OPD effects due to temperature change, and it is utilized to prove the validation of the temperature distribution function. Results show that the impact of surface deformation and stress is negligible compared with the refractive index change; astigmatisms and 4-foil aberrations dominate in the thermal aberration, about 1.7 λ and 0.45 λ. The system takes about one hour to reach thermal equilibrium and the contrast of the imaging of dense lines get worse as time goes on.

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High precision temperature control for projection lens with long time thermal response constant

Cited by 3 publications

References 0 publications

A temperature control algorithm for lithography machine based on generalized predictive control and BP neural network PI control

A temperature control algorithm for lithography machine based on generalized predictive control and BP neural network PI control

High Precision Temperature Control System for an Oven-Controlled Crystal Oscillator

Simulation Research on the Thermal Effects in Dipolar Illuminated Lithography

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