High precision positioning of plasmonic nanoparticle based on damascene process

Abstract

Nanoparticle positioning by a silicon pore array template with decreasing pore diameter down to 16 nm opens up a new way of fabrication of metal nanostructures based on high precision dry etching of silicon. We demonstrate how this process can be used to fabricate plasmonic nano-structures. Plasmonic dipole structures are presented with variable gap size below 20 nm.