In this work, we present a method for targeted and maskless fabrication of single silicon vacancy (V Si ) defect arrays in silicon carbide (SiC) using focused ion beam. Firstly, we studied the photoluminescence (PL) spectrum and optically detected magnetic resonance (ODMR) of the generated defect spin ensemble, confirming that the synthesized centers were in the desired defect state. Then we investigated the fluorescence properties of single V Si defects and our measurements indicate the presence of a photostable single photon source. Finally, we find that the Si ++ ion to V Si defect conversion yield increases as the implanted dose decreases. The reliable production of V Si defects in silicon carbide could pave the way for its applications in quantum photonics and quantum information processing. The resolution of implanted V Si defects is limited to a few tens of nanometers, defined by the diameter of the ion beam.Silicon carbide (SiC) is a technologically mature semiconductor material, which can be grown as inch-scale high-quality single crystal wafers and has been widely used in microelectronics systems and high-power electronics, etc. In recent years, some defects in SiC have been successfully implemented as solid state quantum bit 1-8 and quantum photonics 9-11 . They meet essential requirements for spin-based quantum information processing such as optical initialization, readout and microwave control of the spin state, which are similar as the nitrogen vacancy (NV) centers in diamond. 12 In particular, silicon vacancy (V Si ) defect in 4H-SiC has increasingly attracted attention owing to its excellent features, such as non-blinking single photon emission and long spin coherence times which persist up to room temperature (about 160 µs). 3,5,13 These remarkable properties have been exploited in many applications in quantum