2014
DOI: 10.1117/12.2052615
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High precision AlGaAsSb ridge-waveguide etching byin situreflectance monitored ICP-RIE

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“…The etch stop was controlled precisely, as described in detail in ref. 18, to 100 nm above the active region, using in situ reflectance monitoring.…”
Section: B Device Fabricationsmentioning
confidence: 99%
“…The etch stop was controlled precisely, as described in detail in ref. 18, to 100 nm above the active region, using in situ reflectance monitoring.…”
Section: B Device Fabricationsmentioning
confidence: 99%