High-Power Microwave Window for Reactive Plasma Production

Sakamoto, Yuichi; Kokai, Hideki

doi:10.1143/jjap.32.3985

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1997

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“…ECR sputtering with a magnetron was also studied. 5,7,16,17 A pure magnetic field confinement in the mirror field has not yet been tested for ECR sputtering. Such a system could provide a steady operation at very low pressures pϽ10 Ϫ2 Pa with a large ion flux to a substrate.…”

Section: Introductionmentioning

confidence: 99%

Electron cyclotron resonance plasma enhanced direct current sputtering discharge with magnetic-mirror plasma confinement

Mišina

Setsuhara

Miyake

1997

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Plasma confinement in a mirror magnetic field was applied to the electron cyclotron resonance (ECR) plasma enhanced dc sputtering discharge sustained at pressures below 10−2 Pa. Ion current densities up to 12 mA/cm2, plasma densities about 1011cm−3 and electron temperatures about 25 eV were measured by a Langmuir probe. The cathode current was maximum when the ECR zone was close to the cathodezECR<10 cm (measured from the center of the cathode). A mirror ratio MR⩾3 was necessary for sustaining the discharge at simultaneously large microwave powers and cathode voltages. An application of the system studied to the ion assisted deposition of metallic and compound thin films with a controlled crystal structure is proposed.

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Section: Introductionmentioning

confidence: 99%