2007
DOI: 10.1088/1367-2630/9/5/140
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High-power (>1 W) dilute nitride semiconductor disk laser emitting at 1240 nm

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Cited by 20 publications
(19 citation statements)
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“…The center wavelength of the emission shifts only by 0.06nmK-1, leaving the output power largely unaffected. Such shift is almost an order of magnitude smaller than typical values of 0.3nmK-1 observed for VECSELs based on GaInNAs quantum wells [67], and the temperature-independent differential efficiency of the device is about 2%. The use of InAs QD active regions for VECSELs could achieve high-power lasers in the 900-1300 nm wavelength range.…”
Section: Vecsels With Stranski-krastanow Qdsmentioning
confidence: 57%
“…The center wavelength of the emission shifts only by 0.06nmK-1, leaving the output power largely unaffected. Such shift is almost an order of magnitude smaller than typical values of 0.3nmK-1 observed for VECSELs based on GaInNAs quantum wells [67], and the temperature-independent differential efficiency of the device is about 2%. The use of InAs QD active regions for VECSELs could achieve high-power lasers in the 900-1300 nm wavelength range.…”
Section: Vecsels With Stranski-krastanow Qdsmentioning
confidence: 57%
“…Extending VECSEL wavelengths to the 1200-1350 nm NIR range has been accomplished using the GaInNAs/GaAs dilute nitride material system on GaAs substrates [127]. Output powers as high as 1.4 W at 1230 nm [88] and 0.6 W at 1322 nm [67] have been demonstrated; microchip mode of operation has also been reported in this material system [181].…”
Section: Demonstrated Power Scaling and Wavelength Coveragementioning
confidence: 99%
“…The total mirror thickness is 4.5 mm and it has a thermal impedance of 21 K W À1 for a 100 Â 100 mm 2 laser spot size [18]. VECSEL semiconductor wafer structures require very good epitaxial growth control of the layer compositions, thicknesses and strains; such control is available with the modern metal-organic vapor-phase epitaxy (MOVPE) [18,57,125,126] and molecular beam epitaxy (MBE) [127][128][129] semiconductor growth techniques. Optically pumped VECSELs require very little processing after wafer growth; no lithographic processing is required.…”
Section: On-chip Multilayer Laser Bragg Mirrormentioning
confidence: 99%
“…Two growths required for one component InAs/GaAs QDs [83,84] Reduced design flexibility and low modal gain Strain compensated high indium content InGaAs QWs [85] Strain-related lifetime issues Dilute nitride GaInNAs/GaAs QWs [20,62] Formation of nitrogen-related defects 1150-1300 nm wavelength range has previously been very challenging for the growth of SDLs for two main reasons. First, for conventional InGaAs/GaAs QW material a relatively large content of indium must be used to reduce the bandgap energy to the desired value and the high indium content increases the lattice constant of the material causing buildup of strain in the layer structure.…”
Section: Wavelength Coveragementioning
confidence: 99%