High power density pulsed plasma deposition of titanium carbonitride

Abstract

Titanium carbonitride [Ti(CN)] films were deposited on the surface of No. 45 steel for modification using the high power density pulsed plasma technique. The pulsed plasma is generated from a coaxial plasma gun and has a high electron temperature of 105–106 K and a high electron density of 1014–1016 cm−3; high translation titanium carbonitride [Ti(CN)] films were deposited at 30–50 km/s and were only 60 μs wide. The substrates were maintained at room temperature during the film deposition, but a stronger adhesion of film to substrate existed. A wide mixing interface between the Ti(CN) films and the substrate formed and resulted in a high adherency of the films to the substrate. The surface microhardness of No. 45 steel increased remarkably due to the formation of titanium carbonitride films.

Explosion model applied to an intense pulsed plasma source for thin film deposition

“…I NTENSE pulsed plasma sources have been used extensively for fusion research [1]- [4] and to a lesser extent in plasma assisted materials processing [5]- [9]. Low intensity pulsed plasma sources are more commonly used for the latter applications [10]- [13].…”

“…For this initial condition on , the front of the expanding monomer cloud was at cm, the rarefaction wave [25] was at cm, and the total number of injected monomer molecules was 1. 5 10 . As a summary of the time sequence of events in our model, note that gas expansion from the puff valve started at s and RF heating occurred instantaneously at .…”