1996
DOI: 10.1116/1.579905
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High power density pulsed plasma deposition of titanium carbonitride

Abstract: Titanium carbonitride [Ti(CN)] films were deposited on the surface of No. 45 steel for modification using the high power density pulsed plasma technique. The pulsed plasma is generated from a coaxial plasma gun and has a high electron temperature of 105–106 K and a high electron density of 1014–1016 cm−3; high translation titanium carbonitride [Ti(CN)] films were deposited at 30–50 km/s and were only 60 μs wide. The substrates were maintained at room temperature during the film deposition, but a stronger adhes… Show more

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Cited by 9 publications
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“…I NTENSE pulsed plasma sources have been used extensively for fusion research [1]- [4] and to a lesser extent in plasma assisted materials processing [5]- [9]. Low intensity pulsed plasma sources are more commonly used for the latter applications [10]- [13].…”
Section: Introductionmentioning
confidence: 99%
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“…I NTENSE pulsed plasma sources have been used extensively for fusion research [1]- [4] and to a lesser extent in plasma assisted materials processing [5]- [9]. Low intensity pulsed plasma sources are more commonly used for the latter applications [10]- [13].…”
Section: Introductionmentioning
confidence: 99%
“…For this initial condition on , the front of the expanding monomer cloud was at cm, the rarefaction wave [25] was at cm, and the total number of injected monomer molecules was 1. 5 10 . As a summary of the time sequence of events in our model, note that gas expansion from the puff valve started at s and RF heating occurred instantaneously at .…”
mentioning
confidence: 99%