PACS 42.55. Px, 42.60.Lh, 78.67.De AlGaN/GaN multi-quantum barriers (MQBs) were firstly introduced into violet AlInGaN laser diodes with InGaN multi-quantum wells structure, resulting in drastic improvements in lasing performance. Comparing with conventional AlGaN single electron blocking layer (EBL), lower threshold current and higher slope efficiency at room temperature could be achieved by AlGaN/GaN multiquantum barrier. It can be explained that p-type AlGaN/GaN MQBs is more effective to suppress the overflow of electron than single p-type AlGaN EBL by the increase of effective barrier heights due to the quantum effect of MQB and the enhancement of p-type doping efficiency. Additionally, the strain effect in InGaN multiquantum wells (MQWs) from single p-type AlGaN EBL can be reduced by forming the AlGaN/GaN super lattice structure. 1 Introduction High power AlInGaN-based blue-violet laser diodes (BV-LDs) have attracted great attention as light sources for high-density optical storage systems. Recently, remarkable progress on the development of BV-LD has been made by some research groups. Nichia and Sony reported the development of commercial grade AlInGaN-based BV-LDs [1-3]. In designing a high power laser suitable for use in optical disk systems, research on AlInGaN violet laser diodes is attracting great interest in high power operation and high temperature operation. In realizing these destinations, one of the major problems is the suppression of carrier overflow from the active layer into the p-layer [4]. In the AlGaInP system, Iga et al. proposed the so-called multi-quantum barrier (MQB) structure, consisting of several periods of thin wells and barriers, and they were located between the active layer and the p-cladding layer of LDs to prevent electrons from overflowing [5]. Several researchers adopted the MQB structure with laser diodes and were able to improve laser performance [5,6]. In this study, p-type AlGaN/GaN multi-quantum barriers (MQBs) implemented above the active layer have been successfully employed to improve the threshold current in 405 nm wavelength AlInGaN laser diodes for the first time.