High performance Si immersion gratings patterned with electron beam lithography

Gully-Santiago, Michael; Jaffe, D. T.; Brooks, Cynthia B.; Wilson, Daniel W.; Muller, Richard E.

doi:10.1117/12.2056912

Cited by 9 publications

(8 citation statements)

References 4 publications

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“…To fabricate the proposed waveguide structure, a highly precise Si groove structure can be realized using electron-beam lithography [25], following which a graphene layer can be prepared onto the groove surface through oxidation-reduction [26]. Using plasma-enhanced chemical vapor deposition [27], an insulating SiO 2 layer will be deposited on the Si groove substrate.…”

Section: Modal Properties and Discussionmentioning

confidence: 99%

“…This phenomenon can be attributed to the modal energy gradually concentrating from the gap region to a subwavelength graphene-slot region, as shown in Figs4(d)-(f). On the other hand, an increased chemical potential results in a larger real and a smaller imaginary part of the graphene's refractive index, leading to a transmission mode with a decreased energy confinement and propagation loss (illustrated from Fig.4(g)-(i)), along with a larger propagation distance, mode area and FoM (illustrated from Fig.4(a)-(c)).To fabricate the proposed waveguide structure, a highly precise Si groove structure can be realized using electron-beam lithography[25], following which a graphene layer can be prepared onto the groove surface through oxidation-reduction[26]. Using plasma-enhanced chemical vapor deposition[27], an insulating SiO 2 layer will be deposited on the Si groove substrate.…”

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confidence: 99%

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Ultra-Low Loss Graphene Plasmonic Waveguide for Chip-Scale Terahertz Communication

et al. 2021

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Field-programmable photonic array-based chips will be key components in realizing high-performance THz communication in the future. However, the optical diffraction limit prohibits their integration in chip-level sizes. Although plasmonic waveguides combined with graphene are able to possess mode transmission at THz wavelengths, their operational problems such as complex device structures or high transmission losses still cannot be addressed effectively. In this paper, by relying on a mechanism of THz surface plasmon mode of graphene and an energy distribution mechanism of the refractive index difference region, a novel hybrid graphene plasmonic waveguide is proposed, whose core design part is a simple gap-slot region. This waveguide's transmission distance is one order of magnitude longer than that of the conventional waveguide while retaining the benefit high energy confinement, under appropriate parameters. Hence the proposed waveguide can be an efficient candidate component of field-programmable photonic arrays for THz communication.

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Section: Modal Properties and Discussionmentioning

confidence: 99%

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confidence: 99%

Ultra-Low Loss Graphene Plasmonic Waveguide for Chip-Scale Terahertz Communication

et al. 2021

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“…After a lengthy development process, we can now produce Si immersion gratings of sufficient size and accuracy to meet the needs of GMTNIRS. [12][13][14][15] Model CA1, the immersion grating used in our existing instrument, IGRINS, has a peak to valley wavefront error of 0.16 waves at 633 nm, measured from the front surface. 13 This means that the error in immersion is less than λ/4 down to below the short wavelength end of the H band.…”

Section: Immersion Gratingsmentioning

confidence: 99%

GMTNIRS (Giant Magellan Telescope Near-Infrared Spectrograph): optimizing the design for maximum science productivity and minimum risk

Jaffe

Barnes²,

Brooks

et al. 2014

SPIE Proceedings

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GMTNIRS, the Giant Magellan Telescope near-infrared spectrograph, is a first-generation instrument for the GMT that will provide detailed spectroscopic information about young stellar objects, exoplanets, and cool and/or obscured stars. The optical and mechanical design GMTNIRS presented at a conceptual design review in October 2011 covered all accessible parts of the spectrum from 1.12 to 5.3 microns at R=50,000 (1.12-2.5 microns) and R=100,000 (3-5.3 microns). GMTNIRS uses the GMT adaptive-optics system and has a single 85 milliarcsecond slit. The instrument includes five separate spectrographs for the different atmospheric windows. By use of dichroics that divide the incident light between five separate spectrographs, it observes its entire spectral grasp in a single exposure while having only one cryogenic moving part, a rotating pupil stop.Large, highly accurate silicon immersion gratings are critical to GMTNIRS, since they both permit a design within the allowable instrument volume and enable continuous wavelength coverage on existing detectors. We describe the effort during the preliminary design phase to refine the design of the spectrograph to meet the science goals while minimizing the cost and risk involved in the grating production. We discuss different design options for the individual spectrographs at R=50,000, 67,000, 75,000, and 100,000 and their impact on science return.

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“…Even at small values of δ, however, some portion of the incoming beam will not strike the blazed groove surface because the etching process requires us to leave small, flat intervals in the grating plane that serve as etch stops (Figure 3). With our current manufacturing technique, the loss from the etch-stop flats is ∼ 10% but we can reduce that value using precision electron beam lithographic patterning (Gully-Santiago et al 2014). The minimum strip width for contact lithography is 2µm while concerns about undercutting and breakthrough of the etch barriers place a minimum size of the flats produced by electron-beam lithography of a few hundred nanometers, or 3 − 5% of the groove spacing, whichever is larger.…”

Section: Groove Blockage In Lithographic Si Gratingsmentioning

confidence: 99%

A Grism Design Review and the As-Built Performance of the Silicon Grisms forJWST-NIRCam

Deen¹,

Gully-Santiago²,

Wang³

et al. 2017

PASP

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Grisms are dispersive transmission optics that find their most frequent use in instruments that combine imaging and spectroscopy. This application is particularly popular in the infrared where imagers frequently have a cold pupil in their optical path that is a suitable location for a dispersive element. In particular, several recent and planned space experiments make use of grisms in slitless spectrographs capable of multi-object spectroscopy. We present an astronomer-oriented general purpose introduction to grisms and their use in current and future astronomical instruments. We present a simple, step-by-step procedure for adding a grism spectroscopy capability to an existing imager design. This procedure serves as an introduction to a discussion of the device performance requirements for grisms, focusing in particular on the problems of lithographically patterned silicon devices, the most effective grism technology for the 1.1-8 micron range. We begin by summarizing the manufacturing process of monolithic silicon gratings. We follow this with a report in detail on the as-built performance of parts constructed for a significant new space application, the NIRCam instrument on JWST and compare these measurements to the requirements.

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High performance Si immersion gratings patterned with electron beam lithography

Cited by 9 publications

References 4 publications

Ultra-Low Loss Graphene Plasmonic Waveguide for Chip-Scale Terahertz Communication

Ultra-Low Loss Graphene Plasmonic Waveguide for Chip-Scale Terahertz Communication

GMTNIRS (Giant Magellan Telescope Near-Infrared Spectrograph): optimizing the design for maximum science productivity and minimum risk

A Grism Design Review and the As-Built Performance of the Silicon Grisms forJWST-NIRCam

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