“…Therefore, bulk single crystals may be produced by melt growth techniques such as Czochralski (CZ), floating zone (FZ), vertical Bridgman, and edge-defined film-fed growth (EFG), which paves the way to production of high-quality substrates − as well as to homoepitaxy. Many growth methods are available for epitaxial growth of Ga 2 O 3 polymorphs such as metal–organic chemical vapor deposition (MOCVD), , magnetron sputtering, , mist-chemical vapor deposition (Mist-CVD), , atomic layer deposition (ALD), , pulsed laser deposition (PLD), halide vapor phase epitaxy, and molecular beam epitaxy (MBE). , In spite of the numerous merits of the β-Ga 2 O 3 , there are concerns regarding its anisotropic thermal conductivity and easiness of cleavage. ,, κ-Ga 2 O 3 is the second most stable polymorph, and its orthorhombic cell has higher symmetry with respect to the monoclinic one, which may lead to easier epitaxial growth and novel heterostructures. , Furthermore, it exhibits a spontaneous polarization along the [001] direction of the orthorhombic cell that could help to obtain high-density two-dimensional electron gases (2DEG) at the interface of κ-Ga 2 O 3 based heterostructures, , and thus a conducting channel for high-mobility field effect transistors, which is becoming one of the most intriguing topics of the literature on Ga 2 O 3 . Recently, κ-Ga 2 O 3 , was employed for fabrication of planar diodes and solar-blind UV–C photodetectors .…”