The electrical behaviour of phosphorus in bulk Hgo8Cdo,,Te crystals is compared with that in Hg,,Cd,,Te epitaxial films grown from Te-rich solutions. The mass action constants associated with the process of site transfer of phosphorus atoms from Hg to Te or interstitial lattice sites have been deduced for the bulk crystals and the epitaxial films. Additionally, the mass action constants for the lattice site transfer of As and Sb have also been deduced. The values of these constants indicate that the lack of site transfer from Hg to Te or interstitial lattice sites in the case of Sb and Bi, inferred experimentally in epitaxial films, is ascribed to a lower diffusivity of the Sb and Bi atoms in (Hg, Cd)Te. The implications of the amphoteric behaviour of the group V dopants on device fabrication are also discussed.