2015
DOI: 10.1002/adma.201502222
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High‐Performance Monolayer WS2 Field‐Effect Transistors on High‐κ Dielectrics

Abstract: The combination of high-quality Al2 O3 dielectric and thiol chemistry passivation can effectively reduce the density of interface traps and Coulomb impurities, leading to a significant improvement of the mobility and a transition of the charge transport from the insulating to the metallic regime. A record high mobility of 83 cm(2) V(-1) s(-1) (337 cm(2) V(-1) s(-1) ) is reached at room temperature (low temperature) for monolayer WS2 . A theoretical model for electron transport is also developed.

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Cited by 225 publications
(210 citation statements)
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References 32 publications
(60 reference statements)
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“…4a). On the contrary, semiconducting TMDs can provide thinner layers with a mobility value in the 20-200 cm # /Vs range [78][79] [81][82] [84]. Graphene has been shown to achieve mobility at room temperature exceeding 2,000 cm # /Vs on SiO2 substrates [76] and close to 80,000 cm # /Vs on hexagonal BN [61].…”
Section: Figurementioning
confidence: 99%
See 1 more Smart Citation
“…4a). On the contrary, semiconducting TMDs can provide thinner layers with a mobility value in the 20-200 cm # /Vs range [78][79] [81][82] [84]. Graphene has been shown to achieve mobility at room temperature exceeding 2,000 cm # /Vs on SiO2 substrates [76] and close to 80,000 cm # /Vs on hexagonal BN [61].…”
Section: Figurementioning
confidence: 99%
“…At the transistor level, they translate into specifications for the OFF current, i.e., 599 must be 100 nA/µm in the case of HP devices and 100 pA/µm in the case of LP devices [40] [41]. [73] [74], holes in SOI [74], holes in germanium-on-insulator [75], graphene on SiO2 [76], graphene embedded in h-BN [61], InAs [77], WSe2 [78] [79], WS2 [81], black phosphorus [82] [83], MoS2 [84] [85], c) Experimental Rc of different 2D materials and thin body semiconductors compared with expectations of the ITRS. Data sources: ITRS [40], MoS2 [84], MoS2-2H/Au and MoS2-1T/Au [86], MoS2/Au [87] [88] and MoS2/Ni [87], Pd-Graphene [90], d) Scatter plot of delay time and power-delay product for High Performance Logic of different 2D Heterostructurebased FET and comparison with ITRS 2015 e) Scatter plot of delay time and power-delay product for Low Standby Power logic of different 2D Heterostructure-based FET and comparison with ITRS 2015.…”
Section: Figurementioning
confidence: 99%
“…These conductivities are just above the results of MoO 2 nanorods, and much higher than the conductivities of other 2D compounds such as transition metal dichalcogenides, black phosphorus, and SnO. 2,[34][35][36][37] The exceptionally high conductivity of individual MoO 2 nanosheet is ascribed to the unique crystal structure. To the best of our knowledge, the m-MoO 2 crystal has a rutile-type structure, which is built up by MoO 6 octahedral units (see inset of Fig.…”
mentioning
confidence: 87%
“…Moreover, the large surface to volume ratio in 2D materials enhances the significance of surface interactions and charging effects. Thus, the dielectric permittivity mismatch between the 2D semiconductor materials, the surrounding environment, and an induced strain from capping material can intricately affect the electronic and optoelectronic properties of low dimensional materials [38].…”
Section: Introductionmentioning
confidence: 99%