1998
DOI: 10.1016/s0925-9635(97)00273-2
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High-performance metal-semiconductor field effect transistors from thin-film polycrystalline diamond

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1998
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Cited by 24 publications
(11 citation statements)
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“…The transistor characteristics for devices formed on this type of material suggest that the carriers are dispersed throughout a layer of up to 20 nm in depth. 12 This implies carrier concentrations as high as 10 19 cm Ϫ3 are being achieved in these samples. The variation in carrier concentration with temperature differs markedly in the case of C2, compared to all of the other sample types.…”
mentioning
confidence: 93%
“…The transistor characteristics for devices formed on this type of material suggest that the carriers are dispersed throughout a layer of up to 20 nm in depth. 12 This implies carrier concentrations as high as 10 19 cm Ϫ3 are being achieved in these samples. The variation in carrier concentration with temperature differs markedly in the case of C2, compared to all of the other sample types.…”
mentioning
confidence: 93%
“…Using the surface p-type conductivity of hydrogen-terminated surfaces, high performance metal-semiconductor field effect transistors (MESFETs) [8,9] and metal-insulator-semiconductor FETs (MISFETs) [10,11] have been fabricated on homoepitaxial layers. Even in polycrystalline diamond, MESFETs [12] and MISFETs [13] are also reported.…”
Section: Introductionmentioning
confidence: 99%
“…Surface wetchemical oxygenation removes the conductive layer and restores the insulating properties of diamond. Meanwhile, the surface related conductivity has been utilized for electronic applications like Schottky diodes, MESFET and MOSFET structures [5,[11][12][13].…”
Section: Introductionmentioning
confidence: 99%