Optical Fiber Communication Conference 2018
DOI: 10.1364/ofc.2018.m3f.3
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High-Performance InP PIC Technology Development based on a Generic Photonic Integration Foundry

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Cited by 21 publications
(13 citation statements)
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“…trivial [11] [12]. SOAs have also been developed on the III-V-on-silicon platform, both using direct die-to-wafer bonding and divinylsiloxane-bis-benzocyclobutene (DVS-BCB) adhesive die-to-wafer bonding.…”
mentioning
confidence: 99%
“…trivial [11] [12]. SOAs have also been developed on the III-V-on-silicon platform, both using direct die-to-wafer bonding and divinylsiloxane-bis-benzocyclobutene (DVS-BCB) adhesive die-to-wafer bonding.…”
mentioning
confidence: 99%
“…While the EML devices addressed in sect. 3 rely on dedicated layer structures -adapted to O-, C-and L-band operation, respectively -, the previous PIC devices were realized on a generic monolithic integration platform that has been developed at HHI over the past years [14]. Building on semi-insulating InP substrate (currently 3-in.)…”
Section: Pic Foundry Platformmentioning
confidence: 99%
“…To demonstrate the setup capabilities, we give experimental results that are obtained from integrated devices in indium phosphide (InP). They are fabricated in our generic integration technology [13,14]. The devices are already published elsewhere [15,16], but here we pay special attention to the Müller matrix properties.…”
Section: Pic Characterizationmentioning
confidence: 99%