2015
DOI: 10.1021/am5091066
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High-Performance Hybrid Buffer Layer Using 1,4,5,8,9,11-Hexaazatriphenylenehexacarbonitrile/Molybdenum Oxide in Inverted Top-Emitting Organic Light-Emitting Diodes

Abstract: A high-performance 1,4,5,8,9,11-hexaazatriphenylenehexacarbonitrile (HATCN)/molybdenum oxide (MoO3) hybrid buffer layer with high hole-injection efficiency and superior plasma resistance under the sputtering process was developed. The HATCN enhances the hole-injection efficiency, and the MoO3 effectively protects the underlying organic layers from plasma damage during deposition by sputtering. This improves the characteristics of inverted top-emitting organic light-emitting diodes using a top transparent condu… Show more

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Cited by 20 publications
(11 citation statements)
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“…Compared with the conventional structure, the inverted OLEDs (IOLEDs), which use the air stable metals as top anode and indium-tin-oxide (ITO) as the cathode, have been considered as an advantageous approach to improve the stability and the roll-to-roll fabrication process of flat-panel display (Chu et al, 2006; Morii et al, 2006; Sessolo and Bolink, 2011; Chen et al, 2012; Guo et al, 2017; Fukagawa et al, 2018). Moreover, one benefit of the IOLED is to take advantage of the existing n-type amorphous silicon thin film transistor (a-Si TFT) technology for the development of the active-matrix driving OLED technology (Kabra et al, 2010; Hsieh et al, 2011; Zhong et al, 2011; Park et al, 2015; Hosono et al, 2017).…”
Section: Introductionmentioning
confidence: 99%
“…Compared with the conventional structure, the inverted OLEDs (IOLEDs), which use the air stable metals as top anode and indium-tin-oxide (ITO) as the cathode, have been considered as an advantageous approach to improve the stability and the roll-to-roll fabrication process of flat-panel display (Chu et al, 2006; Morii et al, 2006; Sessolo and Bolink, 2011; Chen et al, 2012; Guo et al, 2017; Fukagawa et al, 2018). Moreover, one benefit of the IOLED is to take advantage of the existing n-type amorphous silicon thin film transistor (a-Si TFT) technology for the development of the active-matrix driving OLED technology (Kabra et al, 2010; Hsieh et al, 2011; Zhong et al, 2011; Park et al, 2015; Hosono et al, 2017).…”
Section: Introductionmentioning
confidence: 99%
“…[5][6][7] Metal-free HAT derivatives can display liquid crystal behaviour, 8 which, in tandem with their electron transport and semiconductor properties, 9 has introduced potential uses in organic electronics. [10][11][12][13][14][15] Electron-deficient HAT derivatives have also been used for anion recognition applications. 16 The ability of HAT-type ligands to bind up to three transition metal ions is of interest in the context of molecular magnetism.…”
mentioning
confidence: 99%
“…As for conductive oxides, their deposition process requires the sputtering method or electron/ion beam-assisted techniques, causing plasma damage of the underlying films [22,23]. This sputtering damage may be alleviated to some degree by using an inserting layer, but complete protection is still a challenge [24][25][26]. Moreover, obtaining high quality oxide film with high transparency and conductivity often requires a high temperature that is harmful to the devices [23,27].…”
Section: Introductionmentioning
confidence: 99%