2008 11th International Biennial Baltic Electronics Conference 2008
DOI: 10.1109/bec.2008.4657490
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High performance GaAs power diodes

Abstract: Films deposited with the Liquid Phase Epitaxy (LPE) technology on the monocristallic GaAs substrates for high voltage power p+-p-i-n-n+ GaAs structures has been developed. Proposed technological and hardware solutions of LPE allow the high efficiency of growing process of diode structures with defined ratings and high structural quality of epitaxial layers. The method and technology for fabrication of GaAs dies for nanosecond range with reverse voltage up to 1200V and current up to 100A is introduced The rever… Show more

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Cited by 4 publications
(3 citation statements)
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“…The analysis of the literature data shows [1,13,[16][17][18][19] that the production of lightly doped GaAs layers and the formation of high-voltage p-n junctions in the process of growth have not been clarified, the nature of residual impurities is not entirely clear, the influence of technological factors on the electrical properties has not been studied, which makes it difficult to create high-voltage switches with subnano-and picosecond speed.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The analysis of the literature data shows [1,13,[16][17][18][19] that the production of lightly doped GaAs layers and the formation of high-voltage p-n junctions in the process of growth have not been clarified, the nature of residual impurities is not entirely clear, the influence of technological factors on the electrical properties has not been studied, which makes it difficult to create high-voltage switches with subnano-and picosecond speed.…”
Section: Methodsmentioning
confidence: 99%
“…In addition, this method has the following advantages over gas-transport and molecular epitaxy: simplicity of equipment, higher growth rates, the possibility of reducing the impurity background, etc. The physicochemical foundations of LPE are well described in a number of monographs [16][17][18].…”
Section: Introductionmentioning
confidence: 99%
“…1 shows the analysed structure geometry taken from [11,13]. GaAs Diode Geometry [11] and doping profile.…”
Section: The Problemmentioning
confidence: 99%