2016
DOI: 10.48550/arxiv.1605.00955
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High-Performance Complementary III-V Tunnel FETs with Strain Engineering

Abstract: Strain engineering has recently been explored to improve tunnel field-effect transistors (TFETs). Here, we report design and performance of strained ultra-thin-body (UTB) III-V TFETs by quantum transport simulations. It is found that for an InAs UTB confined in [001] orientation, uniaxial compressive strain in [100] or [110] orientation shrinks the band gap meanwhile reduces (increases) transport (transverse) effective masses. Thus it improves the ON state current of both n-type and p-type UTB InAs TFETs witho… Show more

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“…The introduction of strain, however, implies also a deterioration of the SS due to the change of the valence subband profile in the source region [124], so that specific design options at the source region may be needed to preserve a steep subthreshold characteristic in the presence of strain [126]. The impact of strain on the bandstructure and the turn-on characteristics of III-V based TFETs is still under investigation at the time of writing [127][128][129].…”
Section: Strain Modeling and Engineeringmentioning
confidence: 99%
“…The introduction of strain, however, implies also a deterioration of the SS due to the change of the valence subband profile in the source region [124], so that specific design options at the source region may be needed to preserve a steep subthreshold characteristic in the presence of strain [126]. The impact of strain on the bandstructure and the turn-on characteristics of III-V based TFETs is still under investigation at the time of writing [127][128][129].…”
Section: Strain Modeling and Engineeringmentioning
confidence: 99%