High-performance coatings for micromechanical mirrors

Gatto, Alexandre; Yang, Minghong; Kaiser, Norbert; Heber, Jörg; Schmidt, Jochen; Sandner, Thilo; Schenk, Harald; Lakner, Hubert

doi:10.1364/ao.45.001602

Cited by 10 publications

(5 citation statements)

References 1 publication

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Aluminum and its various compounds have extensively been used as a substrate for heterogeneous catalysis and the growth of thin metal and semiconductor films for various applications. Especially, fluorinated aluminum and alumina (Al 2 O 3 ) have been used in the applications of optics, deep ultraviolet and vacuum ultraviolet mirrors, lithography, corrosion-resistant coatings, microfabrication, electronics, and catalysis. − On the other hand, alumina thin films are used in various electronic devices as dielectric, tunneling barrier, etc. They have also widely been used in optoelectronic devices such as light-emitting diodes and laser diodes.…”

Section: Introductionmentioning

confidence: 99%

Atomic-Scale Etching Mechanism of Aluminum with Fluorine-Based Plasma

Asaduzzaman

2022

J. Phys. Chem. C

View full text Add to dashboard Cite

A first-principles density functional theory study has been carried out to investigate the etching and corrosion of aluminum with fluorine-based plasma. Aluminum is modeled with the (111) surface of aluminum metal and (0001) surface of alumina, which forms as a thin layer on aluminum. The adsorption of plasma gases, for example, CF4, CHF3, and F2, on both surfaces is investigated. CF4 and CHF3 are very weakly adsorbed on both surfaces. On the other hand, a F2 molecule dissociates on both surfaces, which leads to the interaction of more F atoms to the same Al atom. Maximum three F atoms are allowed to adsorb on a single surface Al atom, which paves the way to form an AlF3 molecule. For all F adsorption, the interaction between F and surface Al is much stronger with aluminum surface compared to alumina surface, which explains the relative difficulty of etching alumina. The isopropyl alcohol, which is used to clean the plasma chamber and removed nonvolatile AlF3, itself adsorb on Al(111) and Al2O3(0001) surfaces. This preadsorbed isopropyl alcohol further activates the neighboring surface Al atoms and thus induces stronger interaction between F and surfaces.

show abstract

Section: Introductionmentioning

confidence: 99%

Atomic-Scale Etching Mechanism of Aluminum with Fluorine-Based Plasma

Asaduzzaman

2022

J. Phys. Chem. C

View full text Add to dashboard Cite

show abstract

“…Fluorinated aluminum and alumina find applications in optics, deep ultraviolet and vacuum ultraviolet mirrors, lithography, corrosion resistant coatings, microfabrication, electronics, and catalysis . Accordingly, the structures, properties, and behaviors of these materials have been studied as both nanoparticles and surface coatings.…”

Section: Introductionmentioning

confidence: 99%

Fluorine plasma treatment of bare and nitrilotris(methylene)triphosphonic acid (NP) protected aluminum: an XPS and ToF-SIMS study

Madaan

Diwan

Linford

2014

Surf. Interface Anal.

View full text Add to dashboard Cite

Nitrilotris(methylene)triphosphonic acid (NP) is a technologically important molecule that has been used for years as a corrosion inhibitor and/or adhesion promoter on aluminum and other metal surfaces. However, to the best of our knowledge, the detailed surface characterization of NP adsorbed on aluminum, or on any other surface, has not been reported. Herein, we report an X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry (ToF-SIMS) analysis of a series of untreated and NP-coated aluminum substrates that were exposed to the downstream products of a fluoroalkane + oxygen plasma for different amounts of time (from 0 to 20 s). As indicated by P 2p, N 1s, Al 2p, O 1s, and F 1s narrow scans, even a 4-s plasma treatment significantly damages the NP protective layer and converts the native aluminum oxide into aluminum oxyfluoride. Heat treatment of the fluorine plasma-treated samples in the air substantially converts the aluminum oxyfluoride back to aluminum oxide, while similar heating under vacuum results in little change to the materials. A slow loss of fluorine from the samples occurs over the course of weeks when they are stored in the air. A ToF-SIMS analysis reveals sets of signals that are consistent with no surface treatment, NP treatment, or fluorine plasma treatment. A principal component analysis of the negative ion ToF-SIMS spectra from the samples shows the expected differentiation of the samples.

show abstract

“…The development of MOEMS for microlithography has begun more than a decade ago [7]- [13]. It passed several stages of MEMS-technologies and distinct designs of actuators and continues to proceed with an ever lasting challenge to identify CMOS-compatible manufacturing processes, which may continuously increase the optical performance of MMAs [14], [15]. The present article discusses steps for the realistic description of optical properties of micro-mirror arrays.…”

Section: Introductionmentioning

confidence: 99%

Contrast properties of spatial light modulators for microlithography

et al. 2007

View full text Add to dashboard Cite

The present article discusses steps for the realistic description of optical properties of micro-mirror arrays (MMA), which are utilized as programmable masks for microlithography. The article focuses on global contrast as an elementary example for the understanding of MMA's diffractive operation principle. Central point will be a discussion of those MEMS properties that influence the global MMA contrast, and how to introduce them into simulation. Surface corrugations of single mirrors and slit properties will be taken into account. Comparison is made with experimental contrast data to validate the theoretical assumptions

show abstract

High-performance coatings for micromechanical mirrors

Cited by 10 publications

References 1 publication

Atomic-Scale Etching Mechanism of Aluminum with Fluorine-Based Plasma

Atomic-Scale Etching Mechanism of Aluminum with Fluorine-Based Plasma

Fluorine plasma treatment of bare and nitrilotris(methylene)triphosphonic acid (NP) protected aluminum: an XPS and ToF-SIMS study

Contrast properties of spatial light modulators for microlithography

Contact Info

Product

Resources

About