A ferroelectric thin film of Aurivillius phase K 0.5 Bi 4.5 Ti 4 O 15 (KBT) with a complex bismuth layer-structure was fabricated using the pulsed laser deposition method. The thin film grown on Pt/Ti/SiO 2 / Si substrate shows a strong c-axis orientation, as revealed by x-ray diffraction results, and platelike growth of grains. A Pt/ KBT/Pt capacitor shows a maximum polarization of about 20 µC/cm 2 . In addition, the capacitor also shows good fatigue resistance, with a decrease of 14.5% in the remanent polarization after 10 7 switching cycles. This Aurivillius phase with four layers of TiO 6 octahedra in its unit cell has a band gap of 3.6 eV, which is greater than that of Bi 4 Ti 3 O 12 .
KeywordsLead, free, potassium, bismuth, titanate, thin, film, complex, Aurivillius, layer, structure
Disciplines
Engineering | Physical Sciences and Mathematics
Publication DetailsCheng, Z, Wang, P, Zhao, H, & Kimura, H (2010), Lead-free potassium bismuth titanate thin film with complex Aurivillius layer structure, Journal of Applied Physics, 107 (8) A ferroelectric thin film of Aurivillius phase K 0.5 Bi 4.5 Ti 4 O 15 ͑KBT͒ with a complex bismuth layer-structure was fabricated using the pulsed laser deposition method. The thin film grown on Pt/ Ti/ SiO 2 / Si substrate shows a strong c-axis orientation, as revealed by x-ray diffraction results, and platelike growth of grains. A Pt/KBT/Pt capacitor shows a maximum polarization of about 20 C / cm 2 . In addition, the capacitor also shows good fatigue resistance, with a decrease of 14.5% in the remanent polarization after 10 7 switching cycles. This Aurivillius phase with four layers of TiO 6 octahedra in its unit cell has a band gap of 3.6 eV, which is greater than that of Bi 4 Ti 3 O 12 .