2022 19th International Multi-Conference on Systems, Signals &Amp; Devices (SSD) 2022
DOI: 10.1109/ssd54932.2022.9955797
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High overtone acoustic resonator HBAR based on IDT's/c-tilted ZnO/Si for timing applications

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Cited by 4 publications
(1 citation statement)
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“…The sputtering chamber was evacuated, and the pre-sputtering process was carried out for at least 15 min in Ar (20 standard cubic centimeters per minute (sccm), working pressure 3 × 10 −3 Torr) to clean the target surface and remove impurities. The ZnO layers were deposited onto fused silica substrates according to optimized sputtering parameters [10,11], which are listed in Table 1. ZnO films of different thickness (grown for different sputtering times) were deposited onto fused silica and silicon substrates in the same sputtering run.…”
Section: Zno Layer Depositionmentioning
confidence: 99%
“…The sputtering chamber was evacuated, and the pre-sputtering process was carried out for at least 15 min in Ar (20 standard cubic centimeters per minute (sccm), working pressure 3 × 10 −3 Torr) to clean the target surface and remove impurities. The ZnO layers were deposited onto fused silica substrates according to optimized sputtering parameters [10,11], which are listed in Table 1. ZnO films of different thickness (grown for different sputtering times) were deposited onto fused silica and silicon substrates in the same sputtering run.…”
Section: Zno Layer Depositionmentioning
confidence: 99%