2002
DOI: 10.1117/12.474617
|View full text |Cite
|
Sign up to set email alerts
|

High-NA and low-residual-aberration projection lens for DUV scanner

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

0
5
0

Year Published

2006
2006
2021
2021

Publication Types

Select...
4
4

Relationship

0
8

Authors

Journals

citations
Cited by 9 publications
(5 citation statements)
references
References 0 publications
0
5
0
Order By: Relevance
“…With the increasing demand of finer optical resolution, higher imaging quality, and larger field of view, largeaperture lenses are widely used in many applications, such as semiconductor lithography apparatus, solidstate laser facilities, and space telescopes. [1][2][3] These lens systems must be very accurate and must minimize distortion of each lens after assembly. However, large aperture usually results in large gravitational sag of a lens under its own weight, which induces wave front errors into the lens system and further deteriorates its optical performance.…”
Section: Introductionmentioning
confidence: 99%
“…With the increasing demand of finer optical resolution, higher imaging quality, and larger field of view, largeaperture lenses are widely used in many applications, such as semiconductor lithography apparatus, solidstate laser facilities, and space telescopes. [1][2][3] These lens systems must be very accurate and must minimize distortion of each lens after assembly. However, large aperture usually results in large gravitational sag of a lens under its own weight, which induces wave front errors into the lens system and further deteriorates its optical performance.…”
Section: Introductionmentioning
confidence: 99%
“…The residual stress affects the performance, life and structural integrity of a given material. Whether minimizing the stress during optical annealing, polishing and other processes [2], or carefully controlling it during material manufacturing [3], measurement procedures are indispensable. Some popular NDT methods used to estimate residual stress are X-ray, neutron diffraction, wafer curvature, ultrasonic method, electrical-magnetic methods, and photoelastic methods [1].…”
mentioning
confidence: 99%
“…Therefore, to achieve better compensation, it is advisable to measure the surface figures of optical components coupled in the lens seat and to include them in the optimization of figure-error balancing. For high-precision optical systems, such as a lithographic projection lens, lens-mounting seats 10 are designed to be stress-free such that stress-related index changes and surface deformations can be neglected. It is generally advisable to measure surface figures in their proper setting within the optical system, so that disturbances due to stress and temperature are appropriately considered in figure-error balancing.…”
Section: Relationship Between Figure Error Andmentioning
confidence: 99%