High Moment Materials and Fabrication Processes for Shielded Perpendicular Write Head Beyond 200 Gb/in$^{2}$

Chen, Y.; Sin, Kyusik; Jiang, H.; Tang, Yaw-Shing; Sasaki, Kazuaki; Torabi, A.F.; Wang, L.; Park, M.; Bai, D.; Shen, Yong; Luo, Peng; Liu, F.; Stoev, K.; Lin, Wen-Chin; Zhu, Jian‐Gang

doi:10.1109/tmag.2006.888200

Cited by 8 publications

(3 citation statements)

References 12 publications

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“…There is also an increasing demand for accurate in-situ control sensors for etch processes used in the manufacture of magnetic data storage devices and silicon wafer technologies as these industries move to ever reducing critical dimensions [3]. The small size and low cost of Retarding Field Energy Analyzers (RFEA) compared with other IED measurement tools mean that it is a useful diagnostic device for both industrial process control and basic research.…”

Section: Introductionmentioning

confidence: 99%

Retarding field energy analyser ion current calibration and transmission

Denieffe¹,

Mahony²,

Maguire³

et al. 2011

J. Phys. D: Appl. Phys.

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Accurate measurement of ion current density and ion energy distributions (IED) is often critical for plasma processes in both industrial and research settings. Retarding field energy analyzers (RFEA) have been used to measure IEDs because they are considered accurate, relatively simple and cost effective. However, their usage for critical measurement of ion current density is less common due to difficulties in estimating the proportion of incident ion current reaching the current collector through the RFEA retarding grids. In this paper an RFEA has been calibrated to measure ion current density from an ion beam at pressures ranging from 0.5 to 50.0 mTorr. A unique method is presented where the currents generated at each of the retarding grids and the RFEA upper face are measured separately, allowing the reduction in ion current to be monitored and accounted for at each stage of ion transit to the collector. From these I-V measurements a physical model is described. Subsequently, a mathematical description is extracted which includes parameters to account for grid transmissions, upper face secondary electron emission and collisionality. Pressure-dependant calibration factors can be calculated from least mean square best fits of the collector current to the model allowing quantitative measurement of ion current density.

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Section: Introductionmentioning

confidence: 99%

Retarding field energy analyser ion current calibration and transmission

Denieffe¹,

Mahony²,

Maguire³

et al. 2011

J. Phys. D: Appl. Phys.

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“…Wafers plated with 90% NiFe as the head core material were further fabricated into individual sliders in the back-end to produce working recording heads. Testing of these heads found extremely good pole erasure performance (17). This result was attributed to both the low coercivity and magnetostriction of the 90% NiFe films in addition to the other aforementioned material properties listed as being beneficial.…”

Section: Slider Level Datamentioning

confidence: 96%

Physical Properties of High Iron Nickel-Iron Films Deposited by Direct Current Plating

Sasaki

Medina

2007

ECS Trans.

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High iron (> 80%) nickel-iron (NiFe) films were electroplated via direct current from a sulfate/chloride bath. When used as the head core material in perpendicular magnetic recording (PMR) write heads, these magnetically soft, high stress, and low magnetostriction (in comparison to NiCoFe and CoFe films) NiFe electroplates were found to be an acceptable potential candidate for the first generation of PMR recording heads.

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“…In an ideal situation with proper thickness of nonmagnetic layer and low structural defects, no remanence can be observed in easy axis and the total magnetization becomes zero when the applied magnetic field is smaller than exchange coupling field ex . In recent years, there have been many studies on SAF multilayers, as it shows great promise as soft underlayers for perpendicular recording media [4,5], high moment write head material [6], and high frequency application [7]. But the reversal process in FeCo/Ru/FeCo SAF multilayers has not been studied yet.…”

Section: Introductionmentioning

confidence: 99%

Study of Magnetization Reversal Process in FeCo/Ru/FeCo Exchange Coupled Synthetic Antiferromagnetic Multilayers

Liu

Ishio

2015

Journal of Nanomaterials

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FeCo/Ru/FeCo exchange coupled synthetic antiferromagnetic multilayers were prepared with two sputtering modes. One is continuous sputtering mode, and the other mode is layer-by-layer sputtering mode. The former mode implies that substrate faced the target and film growth process was continuous when FeCo layers were sputtering, whereas the latter implies that substrate was rotating with the mask at a speed of 5 rpm when FeCo layers were sputtering. It was found that the exchange coupling fieldHexof sample sputtered by layer-by-layer mode was higher than the one sputtered by continuous mode. Domain structures were measured with applying varied in-plane magnetic fields along the easy axis in order to study the magnetization reversal process. We found it is a domain wall move process. When the applied field is smaller thanHex, both the two magnetic layers have domain structure and the domain structure of the two layers is reversed correspondingly. When the applied field is varying in the range of-HextoHex, the domain wall of the two layers moves correspondingly at the same time.

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High Moment Materials and Fabrication Processes for Shielded Perpendicular Write Head Beyond 200 Gb/in$^{2}$

Cited by 8 publications

References 12 publications

Retarding field energy analyser ion current calibration and transmission

Retarding field energy analyser ion current calibration and transmission

Physical Properties of High Iron Nickel-Iron Films Deposited by Direct Current Plating

Study of Magnetization Reversal Process in FeCo/Ru/FeCo Exchange Coupled Synthetic Antiferromagnetic Multilayers

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