2015
DOI: 10.1063/1.4906589
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High mobility back-gated InAs/GaSb double quantum well grown on GaSb substrate

Abstract: We report a backgated InAs/GaSb double quantum well device grown on GaSb substrate. The use of the native substrate allows for high materials quality with electron mobility in excess of 500,000 cm 2 /Vs at sheet charge density of 8x10 11 cm -2 and approaching 100,000 cm 2 /Vs near the charge neutrality point (CNP). Lattice matching between the quantum well structure and the substrate eliminates the need for a thick buffer, enabling large back gate capacitance and efficient coupling with the conduction channels… Show more

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Cited by 17 publications
(20 citation statements)
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“…Devices used in this work were grown and fabricated using the same procedure as the previous study [12]. The only difference is that the wafer was grown in a different growth campaign, and resulted in slightly lower mobility, 200 000 cm 2 =Vs in this material, in comparison with 500 000 cm 2 =Vs in our previously reported results [12], both at N s ¼ 10 12 cm −2 .…”
mentioning
confidence: 99%
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“…Devices used in this work were grown and fabricated using the same procedure as the previous study [12]. The only difference is that the wafer was grown in a different growth campaign, and resulted in slightly lower mobility, 200 000 cm 2 =Vs in this material, in comparison with 500 000 cm 2 =Vs in our previously reported results [12], both at N s ¼ 10 12 cm −2 .…”
mentioning
confidence: 99%
“…Without a complete 2D phase diagram, the inverted regime can only be indirectly inferred, e.g., based on the resistance behavior under in-plane [3,10] or out of plane [10,11] magnetic field. It was not until recently that the complete 2D phase diagram was experimentally demonstrated [9] with the use of high mobility materials and efficient back gate coupling [12].…”
mentioning
confidence: 99%
“…Importantly, the GaSb substrate is lattice matched with the subsequent layers, which eliminates the requirement of a thick buffer layer compared to the commonly used GaAs substrate and therefore enables a strong coupling between the back gate and quantum wells. Furthermore, for such choice of substrate, strain and the amount of dislocations are reduced, resulting in record values of carrier mobility for this type of DQWs [24,25]. The Hall bars of 100 by 20 μm used in our measurements are chemically wet etched [inset of Fig.…”
mentioning
confidence: 99%
“…Our heterostructure was grown by molecular-beam epitaxy [24,25]. A 100 nm buffer layer was first grown on a doped GaSb substrate, followed by a 50 nm AlSb bottom barrier.…”
mentioning
confidence: 99%
“…With these insights about InAs in mind we now turn to the discussion of InAs/GaSb double quantum well structures, which contain a hybridized electron-hole system [27][28][29][30][31][32]. Despite multiple affirmations of edge conduction in the inverted regime of InAs/GaSb [8][9][10][11][12][13][14], a careful analysis of the various possible contributions to edge conduction is missing.…”
Section: Comparison To Transport In Inas/gasbmentioning
confidence: 99%