Recent Advances in Nanofabrication Techniques and Applications 2011
DOI: 10.5772/23630
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High-Index Immersion Lithography

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“…The resolution ( R ) of projection lithography (and of all other lens-based lithographies) is governed by far-field (Fraunhofer) diffraction and constrained by the Rayleigh equation (eq ): where k 1 is a process-dependent factor (with values typically between 0.25 and 0.8), n is the refractive index of the medium, q is the half-aperture angle of the lens or optical imaging system used, and NA corresponds to its numerical aperture. This places the resolution around half the wavelength of the source. Many approaches have been developed by specifically targeting the different parameters of eq to improve lateral resolution, which afforded techniques such as deep and extreme UV lithography, phase-shift lithography, or immersion lithography. As a result, resolutions down to 10 nm can now be achieved. , Deep and extreme UV lithography utilize for instance short wavelengths (193 and 13.5 nm, respectively).…”
Section: Photostructuring Mipsmentioning
confidence: 99%
“…The resolution ( R ) of projection lithography (and of all other lens-based lithographies) is governed by far-field (Fraunhofer) diffraction and constrained by the Rayleigh equation (eq ): where k 1 is a process-dependent factor (with values typically between 0.25 and 0.8), n is the refractive index of the medium, q is the half-aperture angle of the lens or optical imaging system used, and NA corresponds to its numerical aperture. This places the resolution around half the wavelength of the source. Many approaches have been developed by specifically targeting the different parameters of eq to improve lateral resolution, which afforded techniques such as deep and extreme UV lithography, phase-shift lithography, or immersion lithography. As a result, resolutions down to 10 nm can now be achieved. , Deep and extreme UV lithography utilize for instance short wavelengths (193 and 13.5 nm, respectively).…”
Section: Photostructuring Mipsmentioning
confidence: 99%