High fidelity blazed grating replication using nanoimprint lithography

Chang, Chih‐Hao; Montoya, Juan; Akilian, Mireille; Lapsa, A.; Heilmann, Ralf K.; Schattenburg, Mark L.; Li, M.; Flanagan, Kathryn A.; Rasmussen, Andrew; Seely, John F.; Laming, J. M.; Kjornrattanawanich, Benjawan; Goray, Leonid I.

doi:10.1116/1.1809614

Cited by 34 publications

(25 citation statements)

References 12 publications

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“…They have made gratings that meet the mass requirements and that demonstrate the groove form over a range of blaze angles. 15,16,17 They have also successfully applied two low-stress nanoimprint lithography techniques for replicating the grating, a thermal process and an UV-cure process, that are described in Heilmann et al 11 . And they have demonstrated flattening of 100 mm-diameter, 0.5 mm-thin grating substrates to better than 100 nm P-V 18 .…”

Section: Grating Development At Mitmentioning

confidence: 97%

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The Constellation-X reflection grating spectrometer

Cottam

Cash²,

Flanagan

et al. 2006

SPIE Proceedings

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The Constellation-X Reflection Grating Spectrometer (RGS) is designed to provide high-throughput, high-resolution spectra in the long wavelength band of 6 to 50 Å. In the nominal design an array of reflection gratings is mounted at the exit of the Spectroscopy X-ray Telescope (SXT) mirror module. The gratings intercept and disperse light to a designated array of CCD detectors. To achieve the throughput (A eff > 1000 cm 2 below 0.6 keV) and resolution (∆λ/λ > 300 below 0.6 keV) requirements for the instrument we are investigating two possible grating designs. The first design uses inplane gratings in a classical configuration that is very similar to the XMM-Newton RGS. The second design uses offplane gratings in a conical configuration. The off-plane design has the advantage of providing higher reflectivity and potentially, a higher spectral resolution than the in-plane configuration. In our presentation we will describe the performance requirements and the current status of the technology development.

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Section: Grating Development At Mitmentioning

confidence: 97%

“…Sharp features are very well replicated, and the microroughness on the blaze facets is < 0.2 nm. The thin, low-stress nanoimprint lithography layers lead to distortions smaller than 1 arcsec on 100 mm-diameter, 0.5 mm-thin substrates17 .…”

mentioning

confidence: 99%

The Constellation-X reflection grating spectrometer

Cottam

Cash²,

Flanagan

et al. 2006

SPIE Proceedings

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“…7,[9][10][11][12][13] X-ray grating spectrometer dispersion provides much larger resolving power for soft x rays (<∼ 2 keV) than imaging microcalorimeters, which have superior resolution E/∆E for harder x rays. X-ray gratings come in two main flavors: Reflection 4,11,14,15 and transmission gratings. 3,10,16 Transmission gratings are very thin and offer a mass advantage, especially for large aperture x-ray telescopes.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of large-area and low mass critical-angle x-ray transmission gratings

et al. 2014

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Soft x-ray spectroscopy of celestial sources with high resolving power R = E/∆E and large collecting area addresses important science listed in the Astro2010 Decadal Survey New Worlds New Horizons, such as the growth of the large scale structure of the universe and its interaction with active galactic nuclei, the kinematics of galactic outflows, as well as coronal emission from stars and other topics. Numerous studies have shown that a transmission grating spectrometer based on lightweight critical-angle transmission (CAT) gratings can deliver R = 3000-5000 and large collecting area with high efficiency and minimal resource requirements, providing spectroscopic figures of merit at least an order of magnitude better than grating spectrometers on Chandra and XMM-Newton, as well as future calorimeter-based missions. The recently developed CAT gratings combine the advantages of transmission gratings (low mass, relaxed figure and alignment tolerances) and blazed reflection gratings (high broad band diffraction efficiency, utilization of higher diffraction orders). Their working principle based on blazing through reflection off the smooth, ultra-high aspect ratio grating bar sidewalls has previously been demonstrated on small samples with x rays. For larger gratings (area greater than 1 inch square) we developed a fabrication process for grating membranes with a hierarchy of integrated low-obscuration supports. The fabrication involves a combination of advanced lithography and highly anisotropic dry and wet etching techniques. We report on the latest fabrication results of free-standing, large-area CAT gratings with polished sidewalls and preliminary x-ray tests.

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“…Given this requirement, conventional crystalline semiconductor materials, for example silicon, are not suitable to be used as imprinting resist materials. Several groups have demonstrated patterning polymer photonic devices by imprint methods [19][20][21][22][23][24], but they lack the aforementioned HIC-device advantages. Chalcogenide glasses (ChG), on the other hand, have suitable softening characteristics due to their amorphous nature [25].…”

Section: Introductionmentioning

confidence: 99%

Demonstration of high-performance, sub-micron chalcogenide glass photonic devices by thermal nanoimprint

Zou

Moreel

Zhou

et al. 2014

Integrated Optics: Devices, Materials, and Technologies XVIII

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High-index-contrast optical devices form the backbone of densely integrated photonic circuits. While these devices are traditionally fabricated using lithography and etching, their performance is often limited by defects and sidewall roughness arising from fabrication imperfections. This paper reports a versatile, roll-to-roll and backend compatible technique for the fabrication of high-performance, high-index-contrast photonic structures in composition-engineered chalcogenide glass (ChG) thin films. Thin film ChG have emerged as important materials for photonic applications due to their high refractive index, excellent transparency in the infrared and large Kerr non-linearity. Both thermally evaporated and solution processed As-Se thin films are successfully employed to imprint waveguides and micro-ring resonators with high replicability and low surface roughness (0.9 nm). The micro-ring resonators exhibit an ultra-high quality-factor of 4 × 10 5 near 1550 nm wavelength, which represents the highest value reported in ChG micro-ring resonators. Furthermore, sub-micron nanoimprint of ChG films on non-planar plastic substrates is demonstrated, which establishes the method as a facile route for monolithic fabrication of high-index-contrast devices on a wide array of unconventional substrates.

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High fidelity blazed grating replication using nanoimprint lithography

Cited by 34 publications

References 12 publications

The Constellation-X reflection grating spectrometer

The Constellation-X reflection grating spectrometer

Fabrication of large-area and low mass critical-angle x-ray transmission gratings

Demonstration of high-performance, sub-micron chalcogenide glass photonic devices by thermal nanoimprint

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