“…The O 1s spectrum (Figure S22) identifies the lattice oxygen (O L , 529.80 eV), oxygen vacancy (O V , 531.41 eV), and adsorbed oxygen (O Ads , 532.36 eV). 30,31 The stronger EPR signal (Figure S23) signifies the increased O V , which arises from the dynamic change of surface atom arrangement induced by the etching of Cu and B atoms, leading to the lattice defects. 32 Besides, Figure S24 exhibits that Fe, Co, Cu, Mn, Ru, B, and O elements are evenly distributed despite experiencing chemical reconstruction and partial etching during the OER process.…”