High‐energy total reflection X‐ray photoelectron spectroscopy for polished iron surface

Abstract

Total reflection (TR) XPS has been applied to a mirror-polished iron sheet using incident X-ray with the energy range of 1800-3600 eV from synchrotron radiation. XPS spectra measured under the TR conditions show remarkably low background intensity and the relative background intensity becomes lower as the photon energy of incident X-ray increases. These results are explained qualitatively by means of shallow penetration depth of grazing incident X-rays and rather deep escape depth of high-energy photoelectrons. XPS spectra have been recorded under ordinary XPS geometry using X-rays with the same energy range. These spectra are compared with TRXPS, and background spectra are extracted and used for background subtraction for ordinary XPS spectra.

Co‐, Ni‐, and Cu‐Doped Fe‐Based Catalysts for the Microwave‐Assisted Catalytic Pyrolysis of Polyethylene

“…In the Fe 2p spectrum of the Co 1 Fe 9 O x catalyst obtained after use (Figure 6b 1 ), the intensity of the Fe 3 + peaks at 711.1 and 724.56 eV is slightly reduced relative to that observed before use, whereas new peaks corresponding to Fe 0 2p 3/2 and 2p 1/2 appear at 706.7 and 718.71 eV, [40,41] respectively. Simultaneously, the intensity of the Fe 2 + peak increases.…”

Interaction between Ultra-Trace Amount of Cesium and Oxides Studied by Total-Reflection X-Ray Photoelectron Spectroscopy

“…These characteristics result in the extreme low detection limit of TR-XPS compared with that of conventional XPS. Up to now, TR-XPS has been applied to the chemical-state analysis of various samples such as metals [13,14] and semiconductors [15][16][17][18]. However, to the best of our knowledge, there have been no reports on TR-XPS for oxides with wide band-gap, because such insulating materials are hard to be measured due to the positive charge accumulated at the surface.…”