2021
DOI: 10.1039/d1ja00192b
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High-efficiency photoreductive vapor generation of osmium

Abstract: Photochemical vapor generation of Os. OsO4 oxidative product from photolysis of 5% HNO3 medium; reductive product from 1% acetic acid/50 mg L−1 Fe3/2+ an uncharacterized organometallic Os compound [Osw(CO)x(CH3)yHz] detected by ICP-MS.

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Cited by 18 publications
(26 citation statements)
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“…28) and W(CO) 6 (ref. 26) from a formic acid medium, OsO 4 (and RuO 4 ) from dilute nitric acid, 6,27 and a carbonylated compound of Os in a reductive solution of acetic acid. 27…”
Section: Resultsmentioning
confidence: 99%
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“…28) and W(CO) 6 (ref. 26) from a formic acid medium, OsO 4 (and RuO 4 ) from dilute nitric acid, 6,27 and a carbonylated compound of Os in a reductive solution of acetic acid. 27…”
Section: Resultsmentioning
confidence: 99%
“…Both laboratories used the same photochemical reactor, a low pressure 19 W flow-through Hg discharge lamp (Beijing Titan Instrument Co. Ltd., Beijing, China) fitted with an internal channel of synthetic quartz (0.72 mL internal irradiated volume) through which the sample was continuously pumped to expose the analyte solution to (primarily) 185 and 254 nm radiation. 26–28 The irradiated sample was conducted to gas–liquid phase separators (GLS system) fed with a flow of Ar purge gas which served to strip volatile species from the liquid phase and permitted convenient manual syringe sampling of 100–500 μL effluent volumes of gas for analyte characterization by GC-MS.…”
Section: Methodsmentioning
confidence: 99%
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