High-efficiency continuous surface-relief gratings for two-dimensional array generation

Ehbets, P.; Herzig, H. P.; Prongué, D.; Gale, M. D.

doi:10.1364/ol.17.000908

Cited by 42 publications

(14 citation statements)

References 3 publications

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“…Three-dimensional photolithography techniques alleviate this restriction by enabling enhanced control over the photoresist profile. This method has been demonstrated in optics [10][11][12], where 3D lenses exhibit greater performance. For example, the phase Fresnel lens in [12] can be realized as a phase zone plate using only planar technology, but it will have a diminished efficiency compared to a 3D phase Fresnel lens.…”

Section: Literature Review: Three-dimensional Fabricationmentioning

confidence: 99%

Double-Exposure Grayscale Photolithography

Mosher

Waits

Morgan

et al. 2009

J. Microelectromech. Syst.

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Three-dimensional (3D) photoresist structures may be realized by controlling the transmitted UV light intensity in a process termed gray-scale photolithography.Light modulation is accomplished by diffraction through sub-resolution pixels on a photomask. The number of photoresist levels is determined by the number of different pixel sizes on the mask, which is restricted by mask fabrication. This drawback prevents the use of gray-scale photolithography for applications that need a high vertical resolution.The double-exposure gray-scale photolithography technique was developed to improve the vertical resolution without increasing the number of pixel sizes. This is achieved by using two gray-scale exposures prior to development. The resulting overlay produces an exposure dose that is a combination of both exposures.Calibration is utilized to relate the pixel sizes and exposure times to the photoresist height. This calibration enables automated mask design for arbitrary 3D structures and investigation of other effects, such as misalignment between the exposures.

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Section: Literature Review: Three-dimensional Fabricationmentioning

confidence: 99%

Double-Exposure Grayscale Photolithography

Mosher

Waits

Morgan

et al. 2009

J. Microelectromech. Syst.

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“…This algorithm is an extension of that presented by Herzig et al for the design of fan-out elements [9][10][11]. Both methods consist of two optimization steps, the basic GSA and the modified GSA, which optimize the efficiency and the signal window beam profile, respectively.…”

Section: Introductionmentioning

confidence: 99%

“…Figure 1 shows a comparison of the basic GSA and the symmetrical IFTA. The design scheme based on the symmetrical IFTA delivers a much more precise beam profile in the signal window and higher diffraction efficiency for both beam splitting (fan-out) [9][10][11][12] and beam shaping [6].…”

Section: Introductionmentioning

confidence: 99%

Automatic symmetrical iterative Fourier-transform algorithm for the design of diffractive optical elements for highly precise laser beam shaping

Liu

Thomson

Taghizadeh

2006

Journal of Modern Optics

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A symmetrical iterative Fourier-transform algorithm (IFTA) using a combination of phase and amplitude freedom for the design of diffractive optical elements for highly precise laser beam shaping is presented. We compare this method with the basic IFTA and the symmetrical IFTA exclusively using phase freedom, and the basic IFTA using both phase and amplitude freedom, by employing these methods for super-Gaussian beam shaping. While the latter three methods fail to produce satisfactory solutions, the first method results in a beam non-uniformity error of 0.44% and a theoretical efficiency of 97.2%. Moreover, the new approach avoids the use of the trial-and-error method for finding the appropriate modified Fourier-domain constraints during the iteration, which can be difficult for some beam-shaping problems.

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“…6 and is generalized for twodimensional (2-D) design in Ref. 7. Here, nonseparable solutions for a range of 2-D fan-out elements are proposed and compared with separable solutions that are obtained by crossing two 1-D solutions.…”

Section: Introductionmentioning

confidence: 99%

Continuous-relief diffractive optical elements for two-dimensional array generation

et al. 1993

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Continuous surface-relief diffractive optical elements for two-dimensional array generation (fan-out) are designed and fabricated. Separable and nonseparable solutions for the two-dimensional element design are compared. The phase-grating microstructures are generated by laser-beam writing lithography in a single exposure step and converted to nickel shims by electroplating, enabling low-cost replicas to be produced by using laboratory and commercial replication processes. Results are presented for a 9 x 9 fan-out diffractive optical element with a measured efficiency of 94% and an overall uniformity within ±8%; replicas in epoxy have the same efficiency and a uniformity of ± 15%.

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High-efficiency continuous surface-relief gratings for two-dimensional array generation

Cited by 42 publications

References 3 publications

Double-Exposure Grayscale Photolithography

Double-Exposure Grayscale Photolithography

Automatic symmetrical iterative Fourier-transform algorithm for the design of diffractive optical elements for highly precise laser beam shaping

Continuous-relief diffractive optical elements for two-dimensional array generation

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