High-density near-field optical disc recording using phase change media and polycarbonate substrate

Shinoda, Masataka; Saito, Kimihiro; Ishimoto, Tsutomu; Kondo, Takao; Nakaoki, Ariyoshi; Furuki, Motohiro; Takeda, Minoru; Akiyama, Yuuii; Shimouma, Takashi; Yamamoto, Masanobu

doi:10.1117/12.556287

Cited by 27 publications

(31 citation statements)

References 4 publications

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“…T higher refract modified to inclination an margin, vario These design head 23 (see F and the protru the tilt margi because the in Figure 6: prism small line/space image. The image is raster-scanned over the substrate by use of a high-precision "nano-ruler" stage to stitch the mini-fields to large grating patterns.…”

Section: Scanninmentioning

confidence: 99%

Scanning interference evanescent wave lithography for sub-22 nm generations

Xie

Smith

2012

SPIE Proceedings

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In this paper, we report progress in developing a scanning evanescent wave lithography (EWL) imaging head with a twostage gap control system including a DC noise canceling carrying air bearing that floats at a constant air gap with regulated air pressure, and an AC noise canceling piezoelectric transducer with real-time closed-loop feedback from gap detection. Various design aspects of the system including gap detection, prism design and alignment, software integration, feedback actuation and scanning scheme have been carefully considered to ensure sub-100 nm gapping. To validate the design concepts, a prototyped scanning EWL imaging head is integrated into a two-beam interferometer platform for gapping tests and imaging evaluation. Experimental results show successful gap gauging at sub-100 nm with gap noise root-mean-square around 1.38 nm in static gapping and 4.64 nm in linear scanning gapping. We also demonstrate scanning imaging results with NA comparable to previously reported static imaging using both fused silica prism and sapphire prism. Our gapping and imaging results confirmed the promise of scanning EWL to extend optical lithography to sub-22 nm generations.

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Section: Scanninmentioning

confidence: 99%

Scanning interference evanescent wave lithography for sub-22 nm generations

Xie

Smith

2012

SPIE Proceedings

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“…Initial work on near-field (NF) recording work was focused on first surface systems 1,2 . In this case the data sits on the top surface of the disc and is very vulnerable for, e.g.…”

Section: Introductionmentioning

confidence: 99%

Optical feasibility study on a 4-layer cover-incident near-field recording system

2007

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We present a study on the feasibility of extending our current experimental cover-incident near-field recording system to a 4-layer system promising 500 GB storage capacity on a single sided 12 cm disc. We calculated the electromagnetic field inside a 4-layer disc of which the design was optimized to have a minimum in the irradiance near recording layers other than the one that the light is focused on. Furthermore an objective lens and compensation device were designed to accommodate writing and reading from all four layers.

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“…Near-field optics is expected to accomplish super-resolution, because it can handle minute optical information beyond the limit of diffraction. [1][2][3] In order to realize storage devices based on this principle, a near-field optical head in combination with flying-head slider technology has been proposed. [4][5][6] This technology originates in the field of magnetic disk storage, and it can maintain the proximal distance between the aperture and the media surface.…”

Section: Introductionmentioning

confidence: 99%

Fabrication and signal readout of near-field optical contact head with a triangular aperture

et al. 2005

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Near-field optics is one of super-resolution techniques for future data storage system. We have already proposed a nearfield optical flying head with a circular aperture. Realizing higher performance aperture, we also have developed a triangular one which has been experimentally evaluated with scanning near-field optical microscope probe. In this paper, we demonstrate readout performance of this novel aperture mounted near-field head introducing polarization control. In order to scan over a media surface at small spacing condition, we fabricate a "contact" type head having contact pads and a polarization maintaining fiber, because this type of an aperture can only effectively function on condition both of extremely small spacing and applying polarized light. The contact pads and the tip are formed by photolithography with hydrofluoric acid (HF) solution. An aluminum film is formed on the tip. The aperture is formed by squeezing the shading film. Measurement of surface configuration by an interferometer shows that the aperture and the contact pads are almost on the same plane within 5 nm deviation. The media consists of a glass substrate, a titanium layer, a carbon protective layer, and a lubricant layer in sequence. Line-and-space (L&S) patterns whose width are 40~200nm are formed on the titanium layer. The contact head approaches the media surface, and then the media is scanned by a piezo stage. The near-field light generate from the triangular aperture is scattered by the L&S pattern and detected by a photomultiplier tube. Signal readout from the 40-nm-wide L&S pattern is demonstrated.

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High-density near-field optical disc recording using phase change media and polycarbonate substrate

Cited by 27 publications

References 4 publications

Scanning interference evanescent wave lithography for sub-22 nm generations

Scanning interference evanescent wave lithography for sub-22 nm generations

Optical feasibility study on a 4-layer cover-incident near-field recording system

Fabrication and signal readout of near-field optical contact head with a triangular aperture

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