2002
DOI: 10.1016/s0927-0248(02)00053-3
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High-density inductively coupled plasma chemical vapor deposition of silicon nitride for solar cell application

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Cited by 26 publications
(7 citation statements)
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“…2) at around 400 • C as the substrate temperature. 14 Therefore, we presumed that our SiN:H film contained hydrogen more than 4 × 10 21 atoms/cm 3 , because our SiN:H film was fabricated using NH 3 instead of N 2 . Note that the amount of hydrogen in SiN:F was successfully reduced to 1/10 of conventional SiN:H by changing the source gas.…”
Section: Resultsmentioning
confidence: 99%
“…2) at around 400 • C as the substrate temperature. 14 Therefore, we presumed that our SiN:H film contained hydrogen more than 4 × 10 21 atoms/cm 3 , because our SiN:H film was fabricated using NH 3 instead of N 2 . Note that the amount of hydrogen in SiN:F was successfully reduced to 1/10 of conventional SiN:H by changing the source gas.…”
Section: Resultsmentioning
confidence: 99%
“…Although much of the attention in the development of SiN x layers for high performance solar cells has been focused on the optimization of the two roles as an ARC and a passivation layer [9][10][11][12][13][14] it is only recently that the inter-relatedness of these two functions has been elucidated. Jung et al 15 performed a comprehensive study of band gap and defect effects in amorphous silicon nitride (a-SiN x ), indicating the important role of these effects in determining the efficiency of a solar cell.…”
Section: Introductionmentioning
confidence: 99%
“…Interference effects, which also frequently occur when a thin layer of oil on water forms rainbow-like bands of color, are another type of coating in addition to anti-reflection coatings as sunlight hits the solar cell's front, incident energy from the surface is transported into the solar cell and converted into electricity. The reflectivity of the bare silicone surface is usually very high [16][17][18][19][20][21][22][23][24][25][26][27][28][29][30]. It is possible to reflect more than 30% of the incident sunlight.…”
Section: Introductionmentioning
confidence: 99%
“…The incident light will reflect between the sloped surfaces, strengthening the interaction between the incident light and the semiconductor surface. The second layer is protected by a single or multi-layer antireflective coating [24][25][26][27][28][29][30][31][32][33][34][35][36][37][38][39][40]. These coatings are typically very thin, with an optical thickness of about one-quarter to one-half the incident wavelength.…”
Section: Introductionmentioning
confidence: 99%