IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004.
DOI: 10.1109/iedm.2004.1419225
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High density and low power design of MRAM

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Cited by 9 publications
(5 citation statements)
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“…Recently MgO tunnel barriers attained as high as 260% magneto resistance [19], and multi-bit MRAM cell with 2MTJs in parallel was introduced [20]. Multi-layered MRAM as shown in Fig.…”
Section: Multi-layered Mrammentioning
confidence: 99%
“…Recently MgO tunnel barriers attained as high as 260% magneto resistance [19], and multi-bit MRAM cell with 2MTJs in parallel was introduced [20]. Multi-layered MRAM as shown in Fig.…”
Section: Multi-layered Mrammentioning
confidence: 99%
“…The current in each case is represented by Eqs. (1) to (4). In this case, compared to the resistance of the MTJ, the resistance of the switching transistor was sufficiently small when on and could be ignored.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, MTJ films which use MgO and have a magnetoresistance ratio (MR) exceeding 1 have been developed [3]. A method was proposed to connect two magnetic tunnel junctions (MTJ) in parallel on a single layer to produce multivalues, but the area shrinkage effect is small [4]. However, by sharing the selection transistor, serially connecting the multiple layers of the MTJ to the transistor, and making the number of information bits stored in the area of one cell multivalued, the bit unit cost can be reduced to (1/number of deposited layers) [5].…”
Section: Introductionmentioning
confidence: 99%
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“…Recently, MgO tunnel barriers have attained magnetic resistance of as high as 260% [19], and multi-bit MRAM cell with 2 MTJs in parallel was introduced [20]. Multilayered MRAM as shown in Figure 10 is a promising candidate for low-cost MRAM.…”
Section: Proceedings Of Essderc Grenoble France 2005mentioning
confidence: 99%