1988
DOI: 10.1007/bf02744564
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High characteristic temperature of 1·3 µm crescent buried heterostructure laser diodes

Abstract: Two-step liquid phase epitaxy and preferential etching technique have been used to fabricate 1-3 #m InGaAsP/InP buried crescent laser. The p-n-p-n thfistor-like structure is used as the blocking layers. The leakage current is very small even at high temperatures. The characteristic temperature T o at room temperature is as high as 79 K. This value is higher than those ever reported.

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