2004
DOI: 10.1016/j.optcom.2003.12.017
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High-brightness soft X-ray generation under optimized laser-cluster interaction

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Cited by 7 publications
(3 citation statements)
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“…The heating of cluster electrons in circularly polarized laser fields has not yet received much attention, at least theoretically. Experiments with rare-gas clusters show almost no effect on the x-ray emission [32,33,34] and ion energy distribution [35] when laser light of different ellipticity is used. Theoretically, circular polarization is particularly interesting because the above mentioned "collisions with the cluster boundary" are strongly suppressed in this case.…”
Section: Introductionmentioning
confidence: 99%
“…The heating of cluster electrons in circularly polarized laser fields has not yet received much attention, at least theoretically. Experiments with rare-gas clusters show almost no effect on the x-ray emission [32,33,34] and ion energy distribution [35] when laser light of different ellipticity is used. Theoretically, circular polarization is particularly interesting because the above mentioned "collisions with the cluster boundary" are strongly suppressed in this case.…”
Section: Introductionmentioning
confidence: 99%
“…The nonlinear interaction of laser pulses with clusters has been the subject of intense theoretical and experimental research in the last two decades [1]. Particular attention has been devoted to the complex cluster dynamics occurring during and after the interaction with a high-energy ultrashort laser pulse; time-resolved experiments have been performed in single-and doublepulse configurations, looking to electron and ion spectra [2][3][4] and to efficiency in laser absorption and scattering [5,6] as well as to emission in the XUV [7][8][9][10] and x-ray [11][12][13] spectral regions.…”
Section: Introductionmentioning
confidence: 99%
“…To use X-rays for extreme ultraviolet (EUV) lithography [2], X-ray microscopy [3], and analytic techniques [4,5] have drawn much attention because of the need for the new lithography and microscopy techniques [6]. Extreme ultraviolet lithography (EUVL) will require bright, efficient plasma sources for use at soft X-ray wavelengths of 13.5 nm [7].…”
Section: Introductionmentioning
confidence: 99%