High-aspect-ratio ZnSe microstructure generated by spatially shaped femtosecond laser writing assisted with wet chemical etching

Zhou, Sikun; Shen, Li; Wang, Fangjie; Li, Yue; Zhang, Hong; Wang, Shutong; Zhou, Shouhuan

doi:10.1016/j.optlastec.2021.107687

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Cited by 7 publications

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“…NH 4 OH solution does not etch the ZnSe itself 31 . In this solution H 2 O 2 acts as an oxidizing agent (2) 36 :…”

Section: Resultsmentioning

confidence: 99%

Antireflection microstructures on ZnSe for mid- and far- IR fabricated by femtosecond laser ablation assisted with wet chemical etching

Teslenko,

Konstantinova,

Bushunov

et al. 2024

Preprint

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Most infrared materials used in high-power systems, such as optical parametric generators, have high values of refractive indices, which result in high Fresnel losses. The performance of conventional antireflection coatings is limited when used in high-power and ultra-broadband systems. An alternative approach is to fabricate antireflection microstructures (ARMs) that allow for a broadband increase in transmittance without reducing the damage threshold of the material. In this work, ARMs were fabricated on the surface of ZnSe crystals using the femtosecond laser ablation assisted with wet chemical etching method. This allowed to produce high aspect ratio microstructures that increase the transmittance up to 98\% in the mid- and far- infrared regions.

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“…NH 4 OH solution does not etch the ZnSe itself 31 . In this solution H 2 O 2 acts as an oxidizing agent (2) 36 :…”

Section: Resultsmentioning

confidence: 99%

Antireflection microstructures on ZnSe for mid- and far- IR fabricated by femtosecond laser ablation assisted with wet chemical etching

Teslenko,

Konstantinova,

Bushunov

et al. 2024

Preprint

View full text Add to dashboard Cite

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Subtractive 3D Laser Nanolithography of Crystals by Giant Wet-Chemical Etching Selectivity

Seguí

2023

Springer Series in Optical Sciences

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Material removal behavior analysis of ZnSe crystal during side-forward nanoscratching

Xiao

Yin

Cheung

et al. 2023

International Journal of Mechanical Sciences

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High-aspect-ratio ZnSe microstructure generated by spatially shaped femtosecond laser writing assisted with wet chemical etching

Cited by 7 publications

References 28 publications

Antireflection microstructures on ZnSe for mid- and far- IR fabricated by femtosecond laser ablation assisted with wet chemical etching

Antireflection microstructures on ZnSe for mid- and far- IR fabricated by femtosecond laser ablation assisted with wet chemical etching

Subtractive 3D Laser Nanolithography of Crystals by Giant Wet-Chemical Etching Selectivity

Material removal behavior analysis of ZnSe crystal during side-forward nanoscratching

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