Abstract:With the progress of mask writer technology, 50 KV electron beam writers always perform with better pattern fidelity and critical dimension (CD) control than traditional laser raster-scan writers because laser spot size is confined by the laser longer wavelength relative to electron beam. As far as Optical Proximity Correction (OPC) pattern fidelity is concerned, critical masks with OPC process have to choose Variable-Shape-Beam (VSB) electron beam writer presently.However, the over-aggressive OPC fragmentatio… Show more
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