The current trend of modern high‐tech industries toward minimization and increase of surface/bulk feature density is today dictating the search of novel principles and routes. The top‐down approaches such as conventional lithographic techniques are currently able to achieve feature sizes down toward 100 nm; however, the associated cost of their manufacturing increases rapidly as the process shifts to shorter wavelengths. Therefore, bottom‐up approaches such as self‐assembly by means of a chemical or a physical driving force have attracted considerable interest as an alternative way to build periodic nanostructures with a feature size ranging from a few nanometers up to submicrometers. Self‐assembled polymeric systems, especially, have played an important role as templates for nanofabrication; they offer nanotemplates with different morphologies and tunable sizes, are easily removed after reactions, and could be further modified with different functional groups to enhance the interactions. Among the various self‐assembled polymeric systems, block copolymer (BCP) supramolecular assemblies have received considerable attention because of the inherent processing advantages. These supramolecular assemblies are formed by the noncovalent interactions of one of the blocks of the BCP with a low‐molar‐mass additive. Selective extraction of the additive leads to porous membranes or nano‐objects which could then be used as templates for nanofabrication, leading to a variety of ordered organic/inorganic nanostructures. Moreover, if the low‐molecular‐weight additive has some specific properties (optical, conducting, magnetic, etc.) then it gets incorporated in the polymer system without actually going through some tedious synthetic processes. In this chapter, we present an overview of the recent developments in this area, with a special focus on the use of such materials for fabrication of nanomaterials.