2001
DOI: 10.1117/12.435790
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Hidden CD errors due to reticle imperfection

Abstract: The impact of reticle imperfections on resist critical dimension (CD) variation has greatly increased as design rules shrink to smaller than exposure wavelength. Resolution enhancement techniques, such as optical proximity correction (OPC) and phase-shift mask (PSM), add a great deal of complexity to the mask manufacturing process. Stringent requirements in wafer processing make reticles a crucial factor in CD control. However, making a perfect reticle is a significant challenge for mask manufacturers. In this… Show more

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Cited by 4 publications
(4 citation statements)
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“…To some extent, equation (1) takes these considerations into account by using the partial derivation, which perturbs only one of the wafer CD arguments (parameters upon which it depends), presumably, a correspondent mask CD. Still, differences in how a particular mask CD or a particular proximity curve is chosen significantly impacts MEEF value.…”
Section: Introductionmentioning
confidence: 99%
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“…To some extent, equation (1) takes these considerations into account by using the partial derivation, which perturbs only one of the wafer CD arguments (parameters upon which it depends), presumably, a correspondent mask CD. Still, differences in how a particular mask CD or a particular proximity curve is chosen significantly impacts MEEF value.…”
Section: Introductionmentioning
confidence: 99%
“…The MEEF definition presented in 2,3 takes the form of a partial derivative: MEEF = (1) aCDm where CD is the critical dimension on the wafer; CDm is the critical dimension on the mask (in a wafer scale).…”
Section: Introductionmentioning
confidence: 99%
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“…The tolerable size of defects is an important parameter used to determine the reticle cost [1]. For k 1 values larger than 0.7 the tolerable defect size was evaluated by a simple rule of thumb: "a defect on a 4× reticle could be counted on to print at about one-forth its size on the wafer" [2].…”
Section: Introductionmentioning
confidence: 99%