HfO2-based ferroelectric thin film and memory device applications in the post-Moore era: A review

Ferroelectric ZrO2 phases from infrared spectroscopy

“…Ferroelectric thin films of HfO 2 and ZrO 2 have recently garnered considerable attention due to their potential applications in various fields such as nonvolatile memories, [1][2][3][4][5] ferroelectric field-effect transistors, [6][7][8] energy storage, [9][10][11] negative capacitance, [12][13][14] and tunnel junctions. 15,16 HfO 2 and ZrO 2 were also considered for nonlinear optical applications, as they are compatible with silicon photonics.…”

Surface Morphology and Optical Properties of Hafnium Oxide Thin Films Produced by Magnetron Sputtering

“…For example, ALD is a widely used method for the deposition of high-quality HfO 2 thin films due to its excellent conformity and precise thickness control. As reported by Liao et al [15], ALD produces fine-grained films (grain sizes of a few tens of nanometers) with a monoclinic (m-HfO 2 ) crystalline structure. However, the ALD technique is limited to very thin films (few tens of nanometers) and, in addition, may not be suitable for large-scale production.…”

Improved epitaxial growth and multiferroic properties of Bi3Fe2Mn2Ox using CeO2 re-seeding layers

“…It is worth noting that these ferroelectric results still show a high degree of leakage, and the polarization falls behind cuttingedge ferroelectric such as HfO 2 . 42,43 However, the quick switching of these lms (low coercivity) could make them good candidates for low power device applications.…”