HF plasma pencil — new source for plasma surface processing

Janča, Jan; Klíma, Miloš; Slavíček, Pavel; Zajı́čková, Lenka

doi:10.1016/s0257-8972(99)00256-x

Cited by 47 publications

(19 citation statements)

References 8 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…Designed by Janèa et al (Masaryk University, Brno, Republic Czech), the RF pencil (see Fig. 19) is very close [47] to the cold plasma torch. This coaxial device is very small (L < 10cm).…”

Section: Low-powered Dischargesmentioning

confidence: 99%

Atmospheric pressure plasmas: A review

Tendero¹,

Tixier²,

Tristant³

et al. 2006

Spectrochimica Acta Part B: Atomic Spectroscopy

1,282

740

View full text Add to dashboard Cite

“…Designed by Janèa et al (Masaryk University, Brno, Republic Czech), the RF pencil (see Fig. 19) is very close [47] to the cold plasma torch. This coaxial device is very small (L < 10cm).…”

Section: Low-powered Dischargesmentioning

confidence: 99%

Atmospheric pressure plasmas: A review

Tendero¹,

Tixier²,

Tristant³

et al. 2006

Spectrochimica Acta Part B: Atomic Spectroscopy

1,282

740

View full text Add to dashboard Cite

“…The plasma pencil is a radio-frequency (13.56 MHz)-driven plasma jet ignited in a fused silica capillary (inner diameter 2 mm) with a hollow-driving electrode encompassing the capillary [51,52]. There is no grounded electrode.…”

Section: Planar Lif In the Effluent Of A Radio-frequency Plasma Jetmentioning

confidence: 99%

Laser-Induced Fluorescence of Hydroxyl (OH) Radical in Cold Atmospheric Discharges

Voráč¹,

Dvořák²,

Mrkvičková³

2018

Photon Counting - Fundamentals and Applications

View full text Add to dashboard Cite

The application of laser-induced fluorescence (LIF) to measurement of absolute concentration of hydroxyl radicals in cold atmospheric discharges is described. Though only the case of OH is presented, the method can be directly applied to other molecules as well. Starting from the rate equations for the LIF process, the main formulas for two-and multilevel excitation scheme are derived. It is also shown how to use partially saturated LIF in practice, enhancing the signal-to-noise ratio. Practical tips for automating the data evaluation are given, allowing processing large data sets, particularly suitable for planar measurements. Gas temperature estimation from fluorescence on different rotational absorption lines is shown as an attractive method for obtaining temperature maps with high spatial resolution. The important aspects of calibration are discussed, particularly the overlap of the laser line with the selected absorption line and the measurement of the Rayleigh scattering for sensitivity calibration, together with the common sources of errors. The application of OH(A, v 0 =0 X, v 00 = 0) excitation scheme to the effluent of atmospheric pressure plasma jet ignited in argon and of OH(A, v 0 =1 X, v 00 = 0) to the plasma of coplanar surface barrier discharge in air and in water vapor is shown.

show abstract

“…Clarity Lite (DataApex, Prague, Czech Republic) two channel A/D converter module and a laboratory constructed nanomicroampere adjustable constant current source was used for resistance monitoring. For improved hydrophilic properties the glass surfaces were modified using a radiofrequency plasma pen developed at the Masaryk University, Brno, Czech Republic [18].…”

Section: Reagents and Equipmentmentioning

confidence: 99%

“…Fused silica capillaries (100 m id × 360 m od, Polymicro Technologies, USA) were connected to the PDMS block with the LabSmith (LabSmith, Inc.; Livermore, CA, USA) ferrules type C360-100 half-casted into PDMS block to ensure tight input/output without large void volumes. Completion of the chip was performed using plasma pencil [18] producing a stream of cool O 3 containing Ar plasma for activation of the surface of the glass and PDMS to the Si-OH state. The time needed for sufficient treatment of both the PDMS and glass surfaces was about 10 s at which both surfaces were strongly hydrophilic with almost zero contact angle (checked visually with drop of water).…”

Section: Device Fabricationmentioning

confidence: 99%

Metal nano‐film resistivity chemical sensor

Podešva

Foret

2015

Electrophoresis

View full text Add to dashboard Cite

In this work, we present a study on reusable thin metal film resistivity-based sensor for direct measurement of binding of thiol containing molecules in liquid samples. While in bulk conductors the DC current is not influenced by the surface events to a measureable degree in a thin metal layer the electrons close to the surface conduct a significant part of electricity and are influenced by the surface interactions. In this study, the thickness of the gold layer was kept below 100 nm resulting in easily measureable resistivity changes of the metal element upon a surface SH-groups binding. No further surface modifications were necessary. Thin film gold layers deposited on a glass substrate by vacuum sputtering were photolithographically structured into four sensing elements arranged in a Wheatstone bridge to compensate for resistance fluctuations due to the temperature changes. Concentrations as low 100 pM provided measureable signals. The surface after the measurement could be electrolytically regenerated for next measurements.

show abstract

HF plasma pencil — new source for plasma surface processing

Cited by 47 publications

References 8 publications

Atmospheric pressure plasmas: A review

Atmospheric pressure plasmas: A review

Laser-Induced Fluorescence of Hydroxyl (OH) Radical in Cold Atmospheric Discharges

Metal nano‐film resistivity chemical sensor

Contact Info

Product

Resources

About