“…Post-annealing modication is always an effective method for changing the surface and bulk properties of photoelectrodes. In this section, gas-based annealing under various atmospheres, such as H 2 , 7,98-107 NH 3 , 18,108-114 N 2 , [115][116][117] Ar, 118,119 CO, 120 O 2 , 24,121,122 and (NH 4 ) 2 S, 123 and other unique annealing techniques including solid-based annealing, employing S, 124 Mg 16 and Zn, 125,126 and ame annealing 11,127 as well as vacuum annealing 21,128 have been introduced. It should be noted that this section does not include studies of the two-step annealing process, for instance, dip-coating followed by annealing, 129 to avoid complexity and confusion.…”