“…The diffusion of atoms and molecules on crystalline surfaces is fundamental to several technologies [1,2,3,4,5]. This includes heterogeneous catalysis for mass production of essential compounds in the chemical, food and energy industries [6], as well as the growth of thin films for the fabrication of semiconductor devices and novel two-dimensional (2D) materials, such as graphene [7,8]. Planar synthesis technologies, such as Chemical Vapor Deposition (CVD), where surface diffusion plays a key role, are currently attracting increasing attention as an alternative to supply a complete, new generation of atom-thick materials, including semi-metals (graphene, NiTe 2 , VSe 2 ,...) [7,8,9], semiconductors (WS 2 , WSe 2 , MoS 2 , MoSe 2 , MoTe 2 , TaS 2 , RhTe 2 , PdTe 2 ,...) [9,10,11,12], insulators (hexagonal-BN, HfS 2 ,...) [10,13,14], superconductors (NbS 2 , NbSe 2 , NbTe 2 , TaSe 2 ,...) [9,15] and topological insulators (Bi 2 Se 3 , Bi 2 Te 3 , Sb 2 Te 3 ) [16,17,18].…”