“…A critical parameter in delivering practical plasmonic devices is the material preparation methods, which should allow the production of nanostructures with tunable plasmonic properties. So far, nanomaterials and nanodevice manufacturing have traditionally followed two distinct routes: (a) the top-down approach, where a process starts from a uniform material and subsequently finer and finer tools are employed to create smaller structures, like lithographic processes [35][36][37] and/or ion beam nanofabrication [38] and (b) the bottom-up approach, where smaller components of atomic or molecular dimensions self-assemble together, according to a natural physical principle or an externally applied driving force, to give rise to larger and more organized systems, like atomic layer deposition [39], cold welding [40], flash thermal annealing [41,42], pattern transfer [43] and template stripping [44][45][46]. Practically, the top-down approach offers unequalled control and reproducibility down to a few nanometres in feature size but at high cost for large area manufacturing, while the bottom-up route applies for macroscopic scale nanopatterning albeit without the fine feature and reproducibility control.…”