2017
DOI: 10.15217/issn1998984-9.2017.41.59
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Heat-Resistant Silicon-Containing Poly (O- Hydroxyamides) and Photosensitive Compositions on Their Basis

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“…Thermal treatment induces cyclodehydration (chemical reaction schematically presented in Figure 3). 25 Due to these properties, this polyamide is used as a highly heat resistant polymeric material for microelectronics (protective layers in various large‐scale integrated circuits and very large‐scale integrated circuits, humidity sensors, and other electronic devices) 25,28,30–36 25 .…”
Section: Resultsmentioning
confidence: 99%
“…Thermal treatment induces cyclodehydration (chemical reaction schematically presented in Figure 3). 25 Due to these properties, this polyamide is used as a highly heat resistant polymeric material for microelectronics (protective layers in various large‐scale integrated circuits and very large‐scale integrated circuits, humidity sensors, and other electronic devices) 25,28,30–36 25 .…”
Section: Resultsmentioning
confidence: 99%