Has the True Ion-Induced Electron Yield from Copper and Other Metals Been Measured?

Kirchhoff, J. F.; Hale, Edward B.

doi:10.1007/978-1-4615-2840-1_20

Cited by 1 publication

(3 citation statements)

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“…The annealing temperature and duration required for a significant change in γ i for heavily sputtered surfaces and Ar + energies of interest for discharges is unknown. A small decrease in γ i is observed [77] for 10 keV Ar + incident on sputtered Cu when the surface is annealed at 200-300 • C. The changes in γ i with intense sputtering are qualitatively consistent with the changes observed [39,104,105] in surface morphology.…”

Section: Swarm Results For Sputtered Metal Surfacessupporting

confidence: 82%

“…Beam experiments in which the target is cleaned by ion sputtering have been reported [39,44,71,73,74,77]. Experiments using sputtering followed by yield measurements at ion energies below 4 keV are shown for Au targets [71] in figure 1.…”

Section: Beam Results For Clean Metalsmentioning

confidence: 99%

“…Experiments using sputtering followed by yield measurements at ion energies below 4 keV are shown for Au targets [71] in figure 1. Small but repeatable changes in electron yield are found [77] for 100 keV H + ions when sputtered copper is annealed at near 600 K. This is approximately the temperature at which some forms of damage produced by sputtering are observed to annihilate [39]. How these results carry over to the Ar + ions and the much lower energies of interest for discharges is not clear.…”

Section: Beam Results For Clean Metalsmentioning

confidence: 99%

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Cold-cathode discharges and breakdown in argon: surface and gas phase production of secondary electrons

Phelps

Petrović

1999

Plasma Sources Sci. Technol.

803

856

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We review the data and models describing the production of the electrons, termed secondary electrons, that initiate the secondary and subsequent feedback avalanches required for the growth of current during breakdown and for the maintenance of low-current, cold-cathode discharges in argon. First we correlate measurements of the production of secondary electrons at metallic cathodes, i.e. the yields of electrons induced by Ar + ions, fast Ar atoms, metastable atoms and vuv photons. The yields of electrons per ion, fast atom and photon vary greatly with particle energy and surface condition. Then models of electron, ion, fast atom, excited atom and photon transport and kinetics are fitted to electrical-breakdown and low-current, discharge-maintenance data to determine the contributions of various cathode-directed species to the secondary electron production. Our model explains measured breakdown and low-current discharge voltages for Ar over a very wide range of electric field to gas density ratios E/n, i.e. 15 Td to 100 kTd. We review corrections for nonequilibrium electron motion near the cathode that apply to our local-field model of these discharges. Analytic expressions for the cross sections and reaction coefficients used by this and related models are summarized.

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Section: Swarm Results For Sputtered Metal Surfacessupporting

confidence: 82%